J 2002

Enhancement of the Material Surface Properties by Plasma Deposition of Thin Films at Atmospheric Pressure

BURŠÍKOVÁ, Vilma, Pavel SŤAHEL and Jan JANČA

Basic information

Original name

Enhancement of the Material Surface Properties by Plasma Deposition of Thin Films at Atmospheric Pressure

Authors

BURŠÍKOVÁ, Vilma (203 Czech Republic), Pavel SŤAHEL (203 Czech Republic) and Jan JANČA (203 Czech Republic, guarantor)

Edition

Czech. J. Phys. Praha, Institute of Physics Academy of Sciences, 2002, 0011-4626

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 0.311

RIV identification code

RIV/00216224:14310/02:00007010

Organization unit

Faculty of Science

Keywords in English

plasma deposition;surface energy; atmospheric discharge

Tags

Změněno: 23/5/2003 13:22, doc. Mgr. Pavel Sťahel, Ph.D.

Abstract

V originále

Enhancement of the Material Surface Properties by Plasma Deposition of Thin Films at Atmospheric Pressure

Links

GA202/02/0880, research and development project
Name: Depozice tenkých vrstev a modifikace povrchů v tichém a doutnavém výboji za atmosférického tlaku
Investor: Czech Science Foundation, Deposition of thin films and surface modifications in silent and glow discharges at atmospheric pressure
MSM 143100003, plan (intention)
Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development project
Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate