Modification of the optical parameters of silicon thin films due to light scattering

SLÁDEK, Petr, Pavel SŤAHEL and Jiří ŠŤASTNÝ. Modification of the optical parameters of silicon thin films due to light scattering. Journal of Non-Crystalline Solids. Nizozemsko: Elsevier Science B.V., 2002, vol. 2002, 299-302, p. 295-299. ISSN 0022-3093. Available from: https://dx.doi.org/10.1016/S0022-3093(01)00952-8.

Basic information

• Original name: Modification of the optical parameters of silicon thin films due to light scattering
• Authors: SLÁDEK, Petr (203 Czech Republic, guarantor, belonging to the institution), Pavel SŤAHEL (203 Czech Republic, belonging to the institution) and Jiří ŠŤASTNÝ (203 Czech Republic, belonging to the institution).
• Edition: Journal of Non-Crystalline Solids, Nizozemsko, Elsevier Science B.V. 2002, 0022-3093.

Other information

• Original language: English
• Type of outcome: Article in a journal
• Field of Study: 10302 Condensed matter physics
• Country of publisher: Netherlands
• Confidentiality degree: is not subject to a state or trade secret
• Impact factor: Impact factor: 1.435
• RIV identification code: RIV/00216224:14410/02:00007015
• Organization unit: Faculty of Education
• Doi: http://dx.doi.org/10.1016/S0022-3093(01)00952-8
• UT WoS: 000175757400059
• Keywords in English: silicon thin films; absorption coefficient; light sacttering
• Tags: absorption coefficient, light sacttering, silicon thin films
• Tags: International impact, Reviewed

Abstract

The enhanced light absorption observed in microcrystalline and polymorphous hydrogenated silicon films may partly be due to light scattering. To estimate the importance of this phenomenon. we used the new 'photocurrent induced by light scattering' method. The exciting beam is impinging on the sample outside the inter-electrode region: by changing the position of the exciting light spot and the photon energy. it is possible to estimate the light scattering effects. We applied this method to films of different materials and checked our conclusions by using the modified constant photocurrent method.

Links

• MSM 143100003, plan (intention): Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates

• OC 527.20, research and development project: Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů

Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate