FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK and Pavel POKORNÝ. Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods. Surface and Interface Analysis. USA: John Wiley & Sons, 2002, vol. 34, No 1, p. 759-762. ISSN 0142-2421.
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Basic information
Original name Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods
Authors FRANTA, Daniel (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Petr KLAPETEK (203 Czech Republic) and Pavel POKORNÝ (203 Czech Republic).
Edition Surface and Interface Analysis, USA, John Wiley & Sons, 2002, 0142-2421.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.071
RIV identification code RIV/00216224:14310/02:00007050
Organization unit Faculty of Science
UT WoS 000177885900166
Keywords in English TiO2 thin films; optical characterization; AFM; boundary roughness
Tags AFM, boundary roughness, optical characterization, TiO2 thin films
Changed by Changed by: Mgr. Daniel Franta, Ph.D., učo 2000. Changed: 25/12/2003 01:05.
Abstract
In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index.
Links
GA101/01/1104, research and development projectName: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie
Investor: Czech Science Foundation, Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry
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