Characterization of the boundaries of thin films of TiO2 by
atomic force microscopy and optical methods

J 2002

Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods

FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK and Pavel POKORNÝ

Basic information

Original name

Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods

Authors

FRANTA, Daniel (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Petr KLAPETEK (203 Czech Republic) and Pavel POKORNÝ (203 Czech Republic)

Edition

Surface and Interface Analysis, USA, John Wiley & Sons, 2002, 0142-2421

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 1.071

RIV identification code

RIV/00216224:14310/02:00007050

Organization unit

Faculty of Science

UT WoS

000177885900166

Keywords in English

TiO2 thin films; optical characterization; AFM; boundary roughness

Abstract

V originále

In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index.

Links

GA101/01/1104, research and development project

Name: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

Investor: Czech Science Foundation, Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry

Citovat

FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK and Pavel POKORNÝ. Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods. Surface and Interface Analysis. USA: John Wiley & Sons, 2002, vol. 34, No 1, p. 759-762. ISSN 0142-2421.

@article{407667,
   author = {Franta, Daniel and Ohlídal, Ivan and Klapetek, Petr and Pokorný, Pavel},
   article_location = {USA},
   article_number = {1},
   keywords = {TiO2 thin films; optical characterization; AFM; boundary roughness},
   language = {eng},
   issn = {0142-2421},
   journal = {Surface and Interface Analysis},
   title = {Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods},
   url = {http://hydra.physics.muni.cz/~franta/bib/SIA34_759.html},
   volume = {34},
   year = {2002}
}

TY  - JOUR
ID  - 407667
AU  - Franta, Daniel - Ohlídal, Ivan - Klapetek, Petr - Pokorný, Pavel
PY  - 2002
TI  - Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods
JF  - Surface and Interface Analysis
VL  - 34
IS  - 1
SP  - 759-762
EP  - 759-762
PB  - John Wiley & Sons
SN  - 01422421
KW  - TiO2 thin films
KW  - optical characterization
KW  - AFM
KW  - boundary roughness
UR  - http://hydra.physics.muni.cz/~franta/bib/SIA34_759.html
N2  - In this paper slight roughness of the upper boundaries of TiO2 thin films prepared on substrates formed by single-crystal silicon is studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quite strongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO2 films exhibit an inhomogeneity represented by a profile of the complex refractive index.
ER  -

FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK and Pavel POKORNÝ. Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods. \textit{Surface and Interface Analysis}. USA: John Wiley \&{} Sons, 2002, vol.~34, No~1, p.~759-762. ISSN~0142-2421.

Detailed Information on Publication Record