J 2002

Study of mode transition in low pressure capacitive RF discharges in nitrogen

ZAJÍČKOVÁ, Lenka, Pavel DVOŘÁK, Vít KUDRLE and Radek ŠMÍD

Basic information

Original name

Study of mode transition in low pressure capacitive RF discharges in nitrogen

Authors

ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor, belonging to the institution), Pavel DVOŘÁK (203 Czech Republic, belonging to the institution), Vít KUDRLE (203 Czech Republic, belonging to the institution) and Radek ŠMÍD (203 Czech Republic, belonging to the institution)

Edition

Czech. J. Phys. Praha, IOP AS CR, 2002, 0011-4626

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 0.311

RIV identification code

RIV/00216224:14310/02:00007188

Organization unit

Faculty of Science

UT WoS

000178757300064

Keywords in English

RF discharge; mode transition; sheath

Tags

Tags

International impact, Reviewed
Změněno: 27/4/2013 11:28, prof. Mgr. Vít Kudrle, Ph.D.

Abstract

V originále

We have studied the mode transition in low pressure capacitive RF discharges in nitrogen

Links

GP202/01/P106, research and development project
Name: Studium plazmochemických procesů pomocí mikrovlnné a optické spektroskopie
Investor: Czech Science Foundation, Study of plasmachemical processes using microwave and optical spectroscopy
MSM 143100003, plan (intention)
Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development project
Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate

Files attached

124_1.pdf
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