Measurement of concentration of N atoms in afterglow
KUDRLE, Vít, Petr VAŠINA, Antonín TÁLSKÝ and Jan JANČA. Measurement of concentration of N atoms in afterglow. Czech. J. Phys. Praha: IOP AS CR, 2002, 52-D, 52-D, p. 589-595. ISSN 0011-4626. |
Other formats:
BibTeX
LaTeX
RIS
|
Basic information | |
---|---|
Original name | Measurement of concentration of N atoms in afterglow |
Authors | KUDRLE, Vít (203 Czech Republic, guarantor, belonging to the institution), Petr VAŠINA (203 Czech Republic, belonging to the institution), Antonín TÁLSKÝ (203 Czech Republic, belonging to the institution) and Jan JANČA (203 Czech Republic). |
Edition | Czech. J. Phys. Praha, IOP AS CR, 2002, 0011-4626. |
Other information | |
---|---|
Original language | English |
Type of outcome | Article in a journal |
Field of Study | 10305 Fluids and plasma physics |
Country of publisher | Czech Republic |
Confidentiality degree | is not subject to a state or trade secret |
Impact factor | Impact factor: 0.311 |
RIV identification code | RIV/00216224:14310/02:00007189 |
Organization unit | Faculty of Science |
UT WoS | 000178757300088 |
Keywords in English | afterglow; nitrogen; EPR |
Tags | afterglow, EPR, Nitrogen |
Tags | International impact, Reviewed |
Changed by | Changed by: prof. Mgr. Vít Kudrle, Ph.D., učo 2560. Changed: 27. 4. 2013 11:29. |
Abstract |
---|
We carried out the measurements of concentration of N atoms in afterglow |
Links | |
---|---|
GP202/01/P106, research and development project | Name: Studium plazmochemických procesů pomocí mikrovlnné a optické spektroskopie |
Investor: Czech Science Foundation, Study of plasmachemical processes using microwave and optical spectroscopy | |
MSM 143100003, plan (intention) | Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates | |
OC 527.20, research and development project | Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů |
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate |