KLAPETEK, Petr, Ivan OHLÍDAL, Alberto MONTAIGNE-RAMIL, Alberta BONANNI, David STIFTER and Helmut SITTER. Atomic force microscopy characterization of ZnTe epitaxial thin films. Japanese Journal of Applied Physics. Tokyo: Institute of Pure and Applied Physics, 2003, vol. 42, 7B, p. 4706-4709, 5 pp. ISSN 0021-4922.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Atomic force microscopy characterization of ZnTe epitaxial thin films
Authors KLAPETEK, Petr (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Alberto MONTAIGNE-RAMIL (192 Cuba), Alberta BONANNI (380 Italy), David STIFTER (40 Austria) and Helmut SITTER (40 Austria).
Edition Japanese Journal of Applied Physics, Tokyo, Institute of Pure and Applied Physics, 2003, 0021-4922.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher Japan
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 1.171
RIV identification code RIV/00216224:14310/03:00008287
Organization unit Faculty of Science
UT WoS 000184780100024
Keywords in English ZnTe epitaxial films; AFM analysis; faceted boundaries
Tags AFM analysis, faceted boundaries, ZnTe epitaxial films
Changed by Changed by: Mgr. Petr Klapetek, Ph.D., učo 11111. Changed: 12/11/2003 15:29.
Abstract
In this paper, results concerning atomic force microscopy studies of the upper bounaries of ZnTe epitaxial thin films prepared by molecular beam epitaxy onto gallium arsenide single crystal substrates are presented. It is sohw that the upper boundaries exhibit faceted structure which is described by means of statistical analysis.
Links
GA101/01/1104, research and development projectName: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie
Investor: Czech Science Foundation, Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry
GA202/01/1110, research and development projectName: Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou
Investor: Czech Science Foundation, Optical and mechanical properties of DLC : Si thin films prepared by the PECVD method
PrintDisplayed: 30/4/2024 17:11