| OHLÍDAL, Miloslav, Ivan OHLÍDAL, Petr KLAPETEK, Miloš JÁKL, Vladimír ČUDEK and Marek ELIÁŠ. New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters. Japanese Journal of Applied Physics. Tokyo: Institute of Pure and Applied Physics, 2003, vol. 42, 7B, p. 4760-4765, 5 pp. ISSN 0021-4922. |
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@article{490025,
author = {Ohlídal, Miloslav and Ohlídal, Ivan and Klapetek, Petr and Jákl, Miloš and Čudek, Vladimír and Eliáš, Marek},
article_location = {Tokyo},
article_number = {7B},
keywords = {films nonuniform in optical parameters; optical characterization; CN_x and SiO_y mixture films},
language = {eng},
issn = {0021-4922},
journal = {Japanese Journal of Applied Physics},
title = {New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters},
volume = {42},
year = {2003}
}
TY - JOUR
ID - 490025
AU - Ohlídal, Miloslav - Ohlídal, Ivan - Klapetek, Petr - Jákl, Miloš - Čudek, Vladimír - Eliáš, Marek
PY - 2003
TI - New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters
JF - Japanese Journal of Applied Physics
VL - 42
IS - 7B
SP - 4760-4765
EP - 4760-4765
PB - Institute of Pure and Applied Physics
SN - 00214922
KW - films nonuniform in optical parameters
KW - optical characterization
KW - CN_x and SiO_y mixture films
N2 - In this paper, a new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reflectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the films studied. The method is illustrated through the optical analysis of strongly nonuniform thin films formed by a mixture of CN_x and SiO_y deposited onto silicon single-crystal substrates.
ER -
OHLÍDAL, Miloslav, Ivan OHLÍDAL, Petr KLAPETEK, Miloš JÁKL, Vladimír ČUDEK and Marek ELIÁŠ. New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters. \textit{Japanese Journal of Applied Physics}. Tokyo: Institute of Pure and Applied Physics, 2003, vol.~42, 7B, p.~4760-4765, 5 pp. ISSN~0021-4922.
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