Effect of the Discharge Conditions on the Mechanical Properties of the Plasma Deposited DLC:SiOx Films

BURŠÍKOVÁ, Vilma, Pavel DVOŘÁK, Lenka ZAJÍČKOVÁ, Petr KLAPETEK, Jiří BURŠÍK and Jan JANČA. Effect of the Discharge Conditions on the Mechanical Properties of the Plasma Deposited DLC:SiOx Films. In Proceedings of SAPP XIV. Bratislava, Slovak Republic: Pavol Šutta, Jarmila Mullerová, and Róbert Brunner, 2003, p. 197-198. ISBN 80-8040-195-0.

Basic information

Original name

Effect of the Discharge Conditions on the Mechanical Properties of the Plasma Deposited DLC:SiOx Films

Authors

BURŠÍKOVÁ, Vilma (203 Czech Republic, guarantor), Pavel DVOŘÁK (203 Czech Republic), Lenka ZAJÍČKOVÁ (203 Czech Republic), Petr KLAPETEK (203 Czech Republic), Jiří BURŠÍK (203 Czech Republic) and Jan JANČA (203 Czech Republic)

Edition

Bratislava, Slovak Republic, Proceedings of SAPP XIV, p. 197-198, 2 pp. 2003

Publisher

Pavol Šutta, Jarmila Mullerová, and Róbert Brunner

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Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Slovakia

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/03:00008312

Organization unit

Faculty of Science

ISBN

80-8040-195-0

Keywords in English

discharge conditions; mechanical properties; plasma deposited films

Tags

discharge conditions, mechanical properties, plasma deposited films

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Abstract

V originále

Hard diamond like carbon films with insorporation of SiOx were deposited from mixture of methane and HMDSO. The Hardness, elastic modulus, interfacial fracture toughness and their dependence on the HMSDO to methane ratio were studied. The correlation between the discharge parameters and the film properties was determined.

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Links

GA202/01/1110, research and development project	Name: Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou Investor: Czech Science Foundation, Optical and mechanical properties of DLC : Si thin films prepared by the PECVD method
ME 489, research and development project	Name: Studium reaktivity organosilikonových monomerů v depozičním plazmatu
MSM 143100003, plan (intention)	Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development project	Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate