VALTR, Miroslav, Lenka ZAJÍČKOVÁ and Vilma BURŠÍKOVÁ. Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO. In JUNIORMAT 03. 1. vyd. Brno: ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie, 2003, p. 58-59. ISBN 80-214-2462-1.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO
Authors VALTR, Miroslav (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic) and Vilma BURŠÍKOVÁ (203 Czech Republic).
Edition 1. vyd. Brno, JUNIORMAT 03, p. 58-59, 2003.
Publisher ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14330/03:00008608
Organization unit Faculty of Informatics
ISBN 80-214-2462-1
Keywords in English plasma;DLC;films;methane;HMDSO;pecvd;radio frequency;discharge;FTIR;normalized absorbance
Tags discharge, DLC, films, FTIR, HMDSO, Methane, normalized absorbance, PECVD, plasma, radio frequency
Changed by Changed by: RNDr. JUDr. Vladimír Šmíd, CSc., učo 1084. Changed: 29/5/2004 18:14.
Abstract
Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing.
Links
GA202/00/P037, research and development projectName: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu
Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
PrintDisplayed: 18/7/2024 12:29