Optical characterization of ZnSe thin films

D 2003

Optical characterization of ZnSe thin films

FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK, Alberto MONTAIGNE-RAMIL, Alberta BONANNI et. al.

Basic information

Original name

Optical characterization of ZnSe thin films

Authors

FRANTA, Daniel (203 Czech Republic, guarantor), Ivan OHLÍDAL (203 Czech Republic), Petr KLAPETEK (203 Czech Republic), Alberto MONTAIGNE-RAMIL (192 Cuba), Alberta BONANNI (380 Italy), David STIFTER (40 Austria) and Helmut SITTER (40 Austria)

Edition

Bellingham, Washington, USA, 19th Congress of the International Commission for Optics: Optics for the Quality of Life, p. 831-832, 2 pp. 2003

Publisher

SPIE - The International Society for Optical Engineering

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10302 Condensed matter physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

RIV identification code

RIV/00216224:14310/03:00009333

Organization unit

Faculty of Science

ISBN

0-8194-4596-7

UT WoS

000188036900390

Keywords in English

ZnSe; Optical constants; Ellipsometry

Abstract

V originále

In this paper the optical method based on multisample modification variable angle spectroscopic ellipsometry (VASE) is used to characterize thin films of ZnSe prepared by molecular beam epitaxy onto GaAs single crystal substrates. It is found that this method can be employed for determining the spectral dependences of the optical constants and values of the thicknesses of the films mentioned. Moreover, it is shown that using this method the RMS values of the heights and the values of the correlation length characterizing roughness irregularities of the upper boundaries of the films can be determined as well. The application of the method is illustrated by means of characterizing six samples of the ZnSe-films exhibiting different values of the thicknesses.

Links

MSM 143100003, plan (intention)

Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates

Citovat

FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK, Alberto MONTAIGNE-RAMIL, Alberta BONANNI, David STIFTER and Helmut SITTER. Optical characterization of ZnSe thin films. In 19th Congress of the International Commission for Optics: Optics for the Quality of Life. Bellingham, Washington, USA: SPIE - The International Society for Optical Engineering, 2003, p. 831-832. ISBN 0-8194-4596-7.

@inproceedings{491338,
   author = {Franta, Daniel and Ohlídal, Ivan and Klapetek, Petr and MontaigneandRamil, Alberto and Bonanni, Alberta and Stifter, David and Sitter, Helmut},
   address = {Bellingham, Washington, USA},
   booktitle = {19th Congress of the International Commission for Optics: Optics for the Quality of Life},
   keywords = {ZnSe; Optical constants; Ellipsometry},
   language = {eng},
   location = {Bellingham, Washington, USA},
   isbn = {0-8194-4596-7},
   pages = {831-832},
   publisher = {SPIE - The International Society for Optical Engineering},
   title = {Optical characterization of ZnSe thin films},
   url = {http://hydra.physics.muni.cz/~franta/bib/SPIE4829_831.html},
   year = {2003}
}

TY  - JOUR
ID  - 491338
AU  - Franta, Daniel - Ohlídal, Ivan - Klapetek, Petr - Montaigne-Ramil, Alberto - Bonanni, Alberta - Stifter, David - Sitter, Helmut
PY  - 2003
TI  - Optical characterization of ZnSe thin films
PB  - SPIE - The International Society for Optical Engineering
CY  - Bellingham, Washington, USA
SN  - 0819445967
KW  - ZnSe
KW  - Optical constants
KW  - Ellipsometry
UR  - http://hydra.physics.muni.cz/~franta/bib/SPIE4829_831.html
N2  - In this paper the optical method based on multisample modification variable angle spectroscopic ellipsometry (VASE) is used to characterize thin films of ZnSe prepared by molecular beam epitaxy onto GaAs single crystal substrates. It is found that this method can be employed for determining the spectral dependences of the optical constants and values of the thicknesses of the films mentioned. Moreover, it is shown that using this method the RMS values of the heights and the values of the correlation length characterizing roughness irregularities of the upper boundaries of the films can be determined as well. The application of the method is illustrated by means of characterizing six samples of the ZnSe-films exhibiting different values of the thicknesses.
ER  -

FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK, Alberto MONTAIGNE-RAMIL, Alberta BONANNI, David STIFTER and Helmut SITTER. Optical characterization of ZnSe thin films. In \textit{19th Congress of the International Commission for Optics: Optics for the Quality of Life}. Bellingham, Washington, USA: SPIE - The International Society for Optical Engineering, 2003, p.~831-832. ISBN~0-8194-4596-7.

Detailed Information on Publication Record