Plasma enhanced CVD of organisilicon plasma polymers

KUČEROVÁ, Zuzana, Lenka ZAJÍČKOVÁ and Vilma BURŠÍKOVÁ. Plasma enhanced CVD of organisilicon plasma polymers. In WDS 03 Proceedings of contributed papers: Part II. Physics of Plasmas and Ionized media. 1st ed. Prague: Matfyzpress, 2003, p. 330-334. ISBN 80-86732-18-5.

Basic information

Original name

Plasma enhanced CVD of organisilicon plasma polymers

Name in Czech

Plasma enhanced CVD of organisilicon plasma polymers

Authors

KUČEROVÁ, Zuzana (203 Czech Republic), Lenka ZAJÍČKOVÁ (203 Czech Republic, guarantor) and Vilma BURŠÍKOVÁ (203 Czech Republic)

Edition

1. vyd. Prague, WDS 03 Proceedings of contributed papers: Part II. Physics of Plasmas and Ionized media, p. 330-334, 5 pp. 2003

Publisher

Matfyzpress

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Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

Organization unit

Faculty of Science

ISBN

80-86732-18-5

Keywords in English

PECVD; FTIR; HMDSO; SiOx

Tags

FTIR, HMDSO, PECVD, SiOx

Tags

Reviewed

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Abstract

V originále

We deposited organisilicon plasma polymer films from hexamethyldisiloxane (HMDSO) and HMDSO/O2 mixtures by plasma enhanced CVD method. Optical constants in ultraviolet-visible range were obtained by spectroscopic ellipsometry. Fourier transform infrared measurements were performed to characterize chemical bonds in the films.

In Czech

We deposited organisilicon plasma polymer films from hexamethyldisiloxane (HMDSO) and HMDSO/O2 mixtures by plasma enhanced CVD method. Optical constants in ultraviolet-visible range were obtained by spectroscopic ellipsometry. Fourier transform infrared measurements were performed to characterize chemical bonds in the films.