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@inproceedings{491503, author = {Kučerová, Zuzana and Zajíčková, Lenka and Buršíková, Vilma}, address = {Prague}, booktitle = {WDS 03 Proceedings of contributed papers: Part II. Physics of Plasmas and Ionized media}, edition = {1}, keywords = {PECVD; FTIR; HMDSO; SiOx}, language = {eng}, location = {Prague}, isbn = {80-86732-18-5}, pages = {330-334}, publisher = {Matfyzpress}, title = {Plasma enhanced CVD of organisilicon plasma polymers}, year = {2003} }
TY - JOUR ID - 491503 AU - Kučerová, Zuzana - Zajíčková, Lenka - Buršíková, Vilma PY - 2003 TI - Plasma enhanced CVD of organisilicon plasma polymers PB - Matfyzpress CY - Prague SN - 8086732185 KW - PECVD KW - FTIR KW - HMDSO KW - SiOx N2 - We deposited organisilicon plasma polymer films from hexamethyldisiloxane (HMDSO) and HMDSO/O2 mixtures by plasma enhanced CVD method. Optical constants in ultraviolet-visible range were obtained by spectroscopic ellipsometry. Fourier transform infrared measurements were performed to characterize chemical bonds in the films. ER -
KUČEROVÁ, Zuzana, Lenka ZAJÍČKOVÁ and Vilma BURŠÍKOVÁ. Plasma enhanced CVD of organisilicon plasma polymers. In \textit{WDS 03 Proceedings of contributed papers: Part II. Physics of Plasmas and Ionized media}. 1st ed. Prague: Matfyzpress, 2003, p.~330-334. ISBN~80-86732-18-5.
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