MEŠKO, Marcel, Petr VAŠINA, Vít KUDRLE, Antonín TÁLSKÝ and Jan JANČA. Study of high power pulsed microwave discharge. In Microwave discharges: Fundamentals and applications. Greifswald: Institut fuer Niedertemperatur Plasmaphysik, 2003. p. 179-182. ISBN 3-00-011612-5.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Study of high power pulsed microwave discharge
Authors MEŠKO, Marcel (703 Slovakia, guarantor), Petr VAŠINA (203 Czech Republic), Vít KUDRLE (203 Czech Republic), Antonín TÁLSKÝ (203 Czech Republic) and Jan JANČA (203 Czech Republic).
Edition Greifswald, Microwave discharges: Fundamentals and applications, p. 179-182, 2003.
Publisher Institut fuer Niedertemperatur Plasmaphysik
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Germany
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/03:00008710
Organization unit Faculty of Science
ISBN 3-00-011612-5
Keywords in English microwave; pulsed plasma; recombination coefficient
Tags microwave, pulsed plasma, recombination coefficient
Tags International impact
Changed by Changed by: prof. Mgr. Vít Kudrle, Ph.D., učo 2560. Changed: 5. 1. 2007 12:49.
Abstract
Study of high power pulsed microwave discharge
Links
GP202/01/P106, research and development projectName: Studium plazmochemických procesů pomocí mikrovlnné a optické spektroskopie
Investor: Czech Science Foundation, Study of plasmachemical processes using microwave and optical spectroscopy
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development projectName: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate
PrintDisplayed: 7. 10. 2022 11:38