BONAVENTUROVÁ ZRZAVECKÁ, Olga, Alois NEBOJSA, Karel NAVRÁTIL, Stanislav NEŠPŮREK and Josef HUMLÍČEK. Temperature dependence of ellipsometric spectra of poly(methyl-phenylsilane). Thin Solid Films. Elsevier, 2004, 455/2004, may, p. 278-282. ISSN 0040-6090.
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Basic information
Original name Temperature dependence of ellipsometric spectra of poly(methyl-phenylsilane)
Name in Czech Teplotní závislost elipsometrických spekter poly(methyl-phenylsilanu)
Authors BONAVENTUROVÁ ZRZAVECKÁ, Olga (203 Czech Republic, guarantor), Alois NEBOJSA (203 Czech Republic), Karel NAVRÁTIL (203 Czech Republic), Stanislav NEŠPŮREK (203 Czech Republic) and Josef HUMLÍČEK (203 Czech Republic).
Edition Thin Solid Films, Elsevier, 2004, 0040-6090.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 1.647
RIV identification code RIV/00216224:14310/04:00010108
Organization unit Faculty of Science
UT WoS 000221690000049
Keywords in English temperature; ellipsometric spectra; poly(methyl-phenylsilane);
Tags ellipsometric spectra, poly(methyl-phenylsilane), Temperature
Tags International impact, Reviewed
Changed by Changed by: doc. RNDr. Karel Navrátil, CSc., učo 1646. Changed: 13/2/2007 16:32.
Abstract
Comprehensive study of the temperature dependence of ultraviolet-visible ellipsometric spectra of thin films of poly(methyl-phenylsilane). It was found the threshold of irreversible changes of its optical response at 373 K and furthermore the average temperature shift of the lowest excitonic band in the reversible regime.The effect of annealing below and above 373 is studied with low- a high-level of the exposure to UV light.
Abstract (in Czech)
Souhrnná studie teplotní závislosti UV-VIS elipsometrických spekter tenkých vrstev poly(methyl-phenylsilanu). Byl nalezen práh nevratných změn optické odezvy na 373 K a dále průměrný teplotní posuv nejnižšího excitonového pásu v oblasti vratných změn. Efekt žíhání pod a nad 373 K byl studován při nízkém a vysokém stupni UV expozice.
Links
MSM 143100002, plan (intention)Name: Fyzikální vlastnosti nových materiálů a vrstevnatých struktur
Investor: Ministry of Education, Youth and Sports of the CR, Physical properties of new materials and layered structures
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