J 2004

Deposition of thin organosilicon polymer films in atmospheric pressure glow discharge

TRUNEC, David, Zdeněk NAVRÁTIL, Pavel SŤAHEL, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ et. al.

Basic information

Original name

Deposition of thin organosilicon polymer films in atmospheric pressure glow discharge

Name in Czech

Depozice tenkých organosilikonových polymerních vrstev v doutnavém výboji za atmosférického tlaku

Authors

TRUNEC, David (203 Czech Republic, guarantor), Zdeněk NAVRÁTIL (203 Czech Republic), Pavel SŤAHEL (203 Czech Republic), Lenka ZAJÍČKOVÁ (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic) and Jan ČECH (203 Czech Republic)

Edition

Journal of physics D: Applied physics, Bristol, England, IOP Publishing Ltd. 2004, 0022-3727

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 1.642

RIV identification code

RIV/00216224:14310/04:00019785

Organization unit

Faculty of Science

UT WoS

000223510100010

Keywords in English

atmospheric presure glow discharge; nitrogen; deposition; organosilicon

Tags

Tags

International impact, Reviewed
Změněno: 19/12/2006 12:48, doc. Mgr. Zdeněk Navrátil, Ph.D.

Abstract

ORIG CZ

V originále

The atmospheric pressure glow discharge burning in nitrogen with small admixture of organosilicon compounds such as hexamethyldisilazane or hexamethyldisiloxane was used for the deposition of thin organosilicon polymer films. The properties of the discharge were studied by means of optical emission spectroscopy and electrical measurements. The deposited films were characterized by atomic force microscopy, x-ray photoelectron spectroscopy, infrared transmission measurements, ellipsometry, depth sensing indentation technique and contact angle measurements. The films were polymer-like, transparent in the visible range, with uniform thickness and without pinholes. The film hardness varied from 0.3 to 0.6 GPa depending on deposition conditions, the elastic modulus was in the range 15-28 GPa and the surface free energy was in the range 26-45 mJ m-2. The studied films exhibited good adhesion to the substrate.

In Czech

Doutnavý výboj za atmosférického tlaku (APGD) hořící v dusíku s malou příměsí organosilikonových sloučenin jako hexametyldisilazan nebo hexametydisiloxan byl použit pro depozici tenkých polymerních vrstev.

Links

GA202/02/0880, research and development project
Name: Depozice tenkých vrstev a modifikace povrchů v tichém a doutnavém výboji za atmosférického tlaku
Investor: Czech Science Foundation, Deposition of thin films and surface modifications in silent and glow discharges at atmospheric pressure
GP202/02/D097, research and development project
Name: Využití povrchového výboje buzeného za atmosferického tlaku pro modifikaci povrchů a depozici ochranných polymerních vrstev
Investor: Czech Science Foundation, Application of surface discharge at atmospheric pressure for the modification of the surfaces and deposition of polymer protective coatings
MSM 143100003, plan (intention)
Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development project
Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate