| TRUNEC, David, Zdeněk NAVRÁTIL, Pavel SŤAHEL, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ and Jan ČECH. Deposition of thin organosilicon polymer films in atmospheric pressure glow discharge. Journal of physics D: Applied physics. Bristol, England: IOP Publishing Ltd., 2004, vol. 37, No 15, p. 2112-2120. ISSN 0022-3727. |
Other formats:
BibTeX
LaTeX
RIS
@article{557925,
author = {Trunec, David and Navrátil, Zdeněk and Sťahel, Pavel and Zajíčková, Lenka and Buršíková, Vilma and Čech, Jan},
article_location = {Bristol, England},
article_number = {15},
keywords = {atmospheric presure glow discharge; nitrogen; deposition; organosilicon},
language = {eng},
issn = {0022-3727},
journal = {Journal of physics D: Applied physics},
title = {Deposition of thin organosilicon polymer films in atmospheric pressure glow discharge},
url = {http://www.iop.org/EJ/article/0022-3727/37/15/010/d4_15_010.pdf},
volume = {37},
year = {2004}
}
TY - JOUR
ID - 557925
AU - Trunec, David - Navrátil, Zdeněk - Sťahel, Pavel - Zajíčková, Lenka - Buršíková, Vilma - Čech, Jan
PY - 2004
TI - Deposition of thin organosilicon polymer films in atmospheric pressure glow discharge
JF - Journal of physics D: Applied physics
VL - 37
IS - 15
SP - 2112-2120
EP - 2112-2120
PB - IOP Publishing Ltd.
SN - 00223727
KW - atmospheric presure glow discharge
KW - nitrogen
KW - deposition
KW - organosilicon
UR - http://www.iop.org/EJ/article/0022-3727/37/15/010/d4_15_010.pdf
N2 - The atmospheric pressure glow discharge burning in nitrogen with small admixture of organosilicon compounds such as hexamethyldisilazane or hexamethyldisiloxane was used for the deposition of thin organosilicon polymer films. The properties of the discharge were studied by means of optical emission spectroscopy and electrical measurements. The deposited films were characterized by atomic force microscopy, x-ray photoelectron spectroscopy, infrared transmission measurements, ellipsometry, depth sensing indentation technique and contact angle measurements. The films were polymer-like, transparent in the visible range, with uniform thickness and without pinholes. The film hardness varied from 0.3 to 0.6 GPa depending on deposition conditions, the elastic modulus was in the range 15-28 GPa and the surface free energy was in the range 26-45 mJ m-2. The studied films exhibited good adhesion to the substrate.
ER -
TRUNEC, David, Zdeněk NAVRÁTIL, Pavel SŤAHEL, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ and Jan ČECH. Deposition of thin organosilicon polymer films in atmospheric pressure glow discharge. \textit{Journal of physics D: Applied physics}. Bristol, England: IOP Publishing Ltd., 2004, vol.~37, No~15, p.~2112-2120. ISSN~0022-3727.
|
