C 2004

Recent Developments on Ionized Physical Vapour Deposition: Concepts, Determination of the Ionization Efficiency and Improvement of Deposited Films

BRETAGNE, Jean, Ludovic DE POUCQUES, Caroline BOISSE-LAPORTE, Gerard GOUSSET, Marie-Christine HUGON et. al.

Basic information

Original name

Recent Developments on Ionized Physical Vapour Deposition: Concepts, Determination of the Ionization Efficiency and Improvement of Deposited Films

Authors

BRETAGNE, Jean, Ludovic DE POUCQUES, Caroline BOISSE-LAPORTE, Gerard GOUSSET, Marie-Christine HUGON, Jean-Christophe IMBERT, Olivier LEROY, Lionel TEULÉ-GAY, Michel TOUZEAU and Petr VAŠINA

Edition

Netherland, Nanostructured Thin Films and Nanodispersion Strengthened Coating, p. 113-122, 9 pp. NATO Science Series II, Vol 155, 2004

Publisher

Springer, Kluwer Academic Publisher

Other information

Language

English

Type of outcome

Kapitola resp. kapitoly v odborné knize

Field of Study

10305 Fluids and plasma physics

Country of publisher

Netherlands

Confidentiality degree

není předmětem státního či obchodního tajemství

Organization unit

Faculty of Science

ISBN

1-4020-2220-4

Keywords in English

IPVD; magnetron discharge; absorption spectroscopy; deposition
Změněno: 4/10/2004 13:22, prof. Mgr. Petr Vašina, Ph.D.

Abstract

V originále

While most of IPVD reactors use radio frequency coil to create additional ionization, we developed an alternative technique in which the ionization of the emitted sputtered vapor is archived by two microwave antennas. Langmuir probe measurement were used to determine electronic density and temperature. Optical emission and absorption spectroscopy has been performed to determine the ionized fraction of the sputtered vapour. Preliminary results are also given for a conventional IPVD system used for the deposition of Ti-based biomaterials.