| MEDUŇA, Mojmír, Jiří NOVÁK, Václav HOLÝ, Günther BAUER, Claudiu FALUB, Soichiro TSUJINO, Elisabeth MÜLLER, Detlev GRÜTZMACHER, Yves CAMPIDELLI, Olivier KERMARREC a Daniel BENSAHEL. Annealing studies of high Ge composition Si/SiGe multilayers. Zeitschrift fur Kristalographie. R. Oldenbourg Verlag GmbH, 2004, roč. 219, č. 4, s. 195-200. ISSN 0044-2968. |
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@article{566677,
author = {Meduňa, Mojmír and Novák, Jiří and Holý, Václav and Bauer, Günther and Falub, Claudiu and Tsujino, Soichiro and Müller, Elisabeth and Grützmacher, Detlev and Campidelli, Yves and Kermarrec, Olivier and Bensahel, Daniel},
article_number = {4},
keywords = {Reflectivity; X-ray diffraction; Annealing; Diffusion; Si/SiGe multiple quantum wells},
language = {eng},
issn = {0044-2968},
journal = {Zeitschrift fur Kristalographie},
title = {Annealing studies of high Ge composition Si/SiGe multilayers},
volume = {219},
year = {2004}
}
TY - JOUR
ID - 566677
AU - Meduňa, Mojmír - Novák, Jiří - Holý, Václav - Bauer, Günther - Falub, Claudiu - Tsujino, Soichiro - Müller, Elisabeth - Grützmacher, Detlev - Campidelli, Yves - Kermarrec, Olivier - Bensahel, Daniel
PY - 2004
TI - Annealing studies of high Ge composition Si/SiGe multilayers
JF - Zeitschrift fur Kristalographie
VL - 219
IS - 4
SP - 195-200
EP - 195-200
PB - R. Oldenbourg Verlag GmbH
SN - 00442968
KW - Reflectivity
KW - X-ray diffraction
KW - Annealing
KW - Diffusion
KW - Si/SiGe multiple quantum wells
N2 - Temperature stability of SiGe/Si (80% Ge) multilayers was studied using x-ray reflectivity during in-situ annealing at temperature 810C.
ER -
MEDUŇA, Mojmír, Jiří NOVÁK, Václav HOLÝ, Günther BAUER, Claudiu FALUB, Soichiro TSUJINO, Elisabeth MÜLLER, Detlev GRÜTZMACHER, Yves CAMPIDELLI, Olivier KERMARREC a Daniel BENSAHEL. Annealing studies of high Ge composition Si/SiGe multilayers. \textit{Zeitschrift fur Kristalographie}. R. Oldenbourg Verlag GmbH, 2004, roč.~219, č.~4, s.~195-200. ISSN~0044-2968.
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