JAŠEK, Ondřej, Marek ELIÁŠ and Zdeněk FRGALA. Study of carbon films on silicon substrate. Material Science Forum. Switzerland: Trans Tech Publications, 2005, vol. 482, No 1, p. 203-206. ISSN 0255-5476.
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Basic information
Original name Study of carbon films on silicon substrate
Name in Czech Studium uhlíkových vrstem na křemíkových vrstvách
Authors JAŠEK, Ondřej (203 Czech Republic, guarantor), Marek ELIÁŠ (203 Czech Republic) and Zdeněk FRGALA (203 Czech Republic).
Edition Material Science Forum, Switzerland, Trans Tech Publications, 2005, 0255-5476.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher Switzerland
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 0.399
RIV identification code RIV/00216224:14310/05:00013692
Organization unit Faculty of Science
UT WoS 000228329200039
Keywords in English high resolution scanning microscopy; carbon nanostructures; diamond; nanotubes
Tags carbon nanostructures, Diamond, high resolution scanning microscopy, nanotubes
Tags International impact, Reviewed
Changed by Changed by: Mgr. Ondřej Jašek, Ph.D., učo 8533. Changed: 11/12/2006 13:32.
Abstract
Carbon based films on silicon substrates have been studied by high resolution FE SEM equipped by an EDS analyzer. The first type are carbon nanotube (CNT) films prepared on Si/SiO2 substrates with Ni or Fe layers by radiofrequency plasma chemical vapor deposition. Dependence of nanotube films properties on Ni and Fe thickness and deposition conditions have been studied. The second type of films discussed are microcrystalline and nanocrystalline diamond films grown on pre-treated Si substrates by microwave plasma chemical vapor deposition (MPCVD). The pre-treatment was varied and its effect on diamond films was studied.
Abstract (in Czech)
Tenké uhlíkové vrstvy na křemíkových substrátech byly studovány pomocí FE SEM s EDS analyzátorem. Prvním typem jsou vrsty uhlíkových nanotrubek (CNT) připravené na Si/SiO2 substrátech s vrstvou Fe nebo Ni metodou RF-CVD. Byly zkoumány vlastnosti vrstev na tloušťce Fe a Ni vrstev a depozičních podmínkách. Dalším druhem vrstev jsou vrstvy tvořené mikro- a nanokrystalickými diamanty. Tyto vrstvy byly přepraveny na předem ošetřených křemíkových substrátech metodou MPCVD. Hlavním bodem studia vrstev je vliv ošetření vrstem a jeho parametrů na výslednou diamantovou vrstvu.
Links
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
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