J 2005

X-ray diffuse scattering from defects in nitrogen-doped Czochralski grown silicon wafers

KLANG, Pavel, Václav HOLÝ, Josef KUBĚNA, Richard ŠTOUDEK, Jan ŠIK et. al.

Basic information

Original name

X-ray diffuse scattering from defects in nitrogen-doped Czochralski grown silicon wafers

Name in Czech

Rentgenový difúzní rozptyl od defektů v dusíkem leogovaných křemíkových deskaách připravených Czochralského metodou

Authors

KLANG, Pavel (203 Czech Republic, guarantor), Václav HOLÝ (203 Czech Republic), Josef KUBĚNA (203 Czech Republic), Richard ŠTOUDEK (203 Czech Republic) and Jan ŠIK (203 Czech Republic)

Edition

J. Phys. D: Appl. Phys. Velká Britanie, IOP Publishing Ltd, 2005, 0022-3727

Other information

Language

English

Type of outcome

Article in a journal

Field of Study

10302 Condensed matter physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

is not subject to a state or trade secret

Impact factor

Impact factor: 1.957

RIV identification code

RIV/00216224:14310/05:00013724

Organization unit

Faculty of Science

UT WoS

000230243500021

Keywords in English

X-ray; diffuse scattering; defects; nitrogen; silicon
Changed: 13/3/2006 17:54, Mgr. Pavel Klang, Ph.D.

Abstract

V originále

We have studied nitrogen-doped silicon wafers from origin, middle and end of the ingot, annealed at low and high temperatures, using triple-axis high-resolution X-ray diffraction. The reciprocal space intensity distributions from clusters, stacking faults and dislocation loops were modelled using the Krivoglaz theory and a continuum model of the defect deformation field. Good agreement of the theory with the experimental data was achieved for the model of dislocation loops. The symmetry of measured reciprocal space maps determines the type of dislocation loops and from cross sections we can obtain the radius and concentration of the loops. These parameters were combined with the results from selective etching and infrared absorption spectroscopy method.

Links

MSM 143100002, plan (intention)
Name: Fyzikální vlastnosti nových materiálů a vrstevnatých struktur
Investor: Ministry of Education, Youth and Sports of the CR, Physical properties of new materials and layered structures
MSM0021622410, plan (intention)
Name: Fyzikální a chemické vlastnosti pokročilých materiálů a struktur
Investor: Ministry of Education, Youth and Sports of the CR, Physical and chemical properties of advanced materials and structures