Comparison of the ionization efficiency of two ionized physical
vapour deposition processes: magnetron discharge assisted by
microwave plasma or radio-frequency plasma

D 2004

Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma

DE POUSQUES, Ludovic, Jean-Christiphe IMBERT, Petr VAŠINA, Caroline BOISSE-LAPORTE, Lionel TEULE-GAY et. al.

Basic information

Original name

Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma

Name in Czech

Srovnani ionizacni ucinnosti dvou IPVD procesu: magnetronoveho vyboje s dodatecnym mikrovlnnym nebo RF vybojem

Authors

DE POUSQUES, Ludovic (250 France), Jean-Christiphe IMBERT (250 France), Petr VAŠINA (203 Czech Republic, guarantor), Caroline BOISSE-LAPORTE (250 France), Lionel TEULE-GAY (250 France) and Michel TOUZEAU (250 France)

Edition

Garmisch-Partenkirchen, Germany, Prosseding of Ninth International Conference on Plasma Surface Engineering, p. 23-23, 2004

Publisher

Prosseding of Ninth International Conference on Plasma Surface Engineering

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Germany

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/04:00024540

Organization unit

Faculty of Science

Keywords in English

IPVD; microwave; RF; magnetron

Abstract

ORIG CZ

V originále

The objective of this work is to compare two IPVD processes developed in our laboratory, in particular the ionization efficiency of each system

In Czech

Cilem teto prace je srovnat dva IPVD procesu, zejmena ionizacni potencial kazdeho z nich

Links

GD202/03/H162, research and development project

Name: Pokročilé směry ve fyzice a chemii plazmatu

Investor: Czech Science Foundation

MSM 143100003, plan (intention)

Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates

Citovat

DE POUSQUES, Ludovic, Jean-Christiphe IMBERT, Petr VAŠINA, Caroline BOISSE-LAPORTE, Lionel TEULE-GAY and Michel TOUZEAU. Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma. In Prosseding of Ninth International Conference on Plasma Surface Engineering. Garmisch-Partenkirchen, Germany: Prosseding of Ninth International Conference on Plasma Surface Engineering, 2004, p. 23.

@inproceedings{572554,
   author = {de Pousques, Ludovic and Imbert, JeanandChristiphe and Vašina, Petr and BoisseandLaporte, Caroline and TeuleandGay, Lionel and Touzeau, Michel},
   address = {Garmisch-Partenkirchen, Germany},
   booktitle = {Prosseding of Ninth International Conference on Plasma Surface Engineering},
   keywords = {IPVD; microwave; RF; magnetron},
   language = {eng},
   location = {Garmisch-Partenkirchen, Germany},
   pages = {23-23},
   publisher = {Prosseding of Ninth International Conference on Plasma Surface Engineering},
   title = {Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma},
   year = {2004}
}

TY  - JOUR
ID  - 572554
AU  - de Pousques, Ludovic - Imbert, Jean-Christiphe - Vašina, Petr - Boisse-Laporte, Caroline - Teule-Gay, Lionel - Touzeau, Michel
PY  - 2004
TI  - Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma
PB  - Prosseding of Ninth International Conference on Plasma Surface Engineering
CY  - Garmisch-Partenkirchen, Germany
KW  - IPVD
KW  - microwave
KW  - RF
KW  - magnetron
N2  - The objective of this work is to compare two IPVD processes developed in our laboratory, in particular the ionization efficiency of each system
ER  -

DE POUSQUES, Ludovic, Jean-Christiphe IMBERT, Petr VAŠINA, Caroline BOISSE-LAPORTE, Lionel TEULE-GAY and Michel TOUZEAU. Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma. In \textit{Prosseding of Ninth International Conference on Plasma Surface Engineering}. Garmisch-Partenkirchen, Germany: Prosseding of Ninth International Conference on Plasma Surface Engineering, 2004, p.~23.

Detailed Information on Publication Record