KUČEROVÁ, Zuzana, Vilma BURŠÍKOVÁ, Lenka ZAJÍČKOVÁ, Jana FRANCLOVÁ and Vratislav PEŘINA. Thermal stability of SiOxCyHz films prepared by PECVD. Chemické listy. Praha: Česká společnost chemická, 2005, vol. 99, s49-s625, p. 465-467. ISSN 0009-2770.
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Basic information
Original name Thermal stability of SiOxCyHz films prepared by PECVD
Name in Czech termální stabilita SiOxCyHz vrstev připravených metodou PECVD
Authors KUČEROVÁ, Zuzana (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Jana FRANCLOVÁ (203 Czech Republic) and Vratislav PEŘINA (203 Czech Republic).
Edition Chemické listy, Praha, Česká společnost chemická, 2005, 0009-2770.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 0.445
RIV identification code RIV/00216224:14310/05:00013953
Organization unit Faculty of Science
Keywords in English thermal stability; TDS; PECVD; FTIR; RBSW; ERDA
Tags ERDA, FTIR, PECVD, RBSW, TDS, thermal stability
Changed by Changed by: Mgr. Jana Meixnerová, Ph.D., učo 13309. Changed: 16/11/2006 21:25.
Abstract
Thermal stability of SiOxCyHz films prepared using PECVD was studied by TDS, FTIR, RBS, ERDA and spectroscopic elipsometry.
Abstract (in Czech)
Termální stabilta vrstev SiOxCyHz připravovaných metodou PECVD byla studována pomocí TDS, FTIR, RBS, ERDA and spectroskopické elipsometrie.
Links
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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