KUČEROVÁ, Zuzana, Vilma BURŠÍKOVÁ, Lenka ZAJÍČKOVÁ, Jana FRANCLOVÁ and Vratislav PEŘINA. Thermal stability of SiOxCyHz films prepared by PECVD. Chemické listy. Praha: Česká společnost chemická, 2005, vol. 99, s49-s625, p. 465-467. ISSN 0009-2770. |
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@article{578882, author = {Kučerová, Zuzana and Buršíková, Vilma and Zajíčková, Lenka and Franclová, Jana and Peřina, Vratislav}, article_location = {Praha}, article_number = {s49-s625}, keywords = {thermal stability; TDS; PECVD; FTIR; RBSW; ERDA}, language = {eng}, issn = {0009-2770}, journal = {Chemické listy}, title = {Thermal stability of SiOxCyHz films prepared by PECVD}, volume = {99}, year = {2005} }
TY - JOUR ID - 578882 AU - Kučerová, Zuzana - Buršíková, Vilma - Zajíčková, Lenka - Franclová, Jana - Peřina, Vratislav PY - 2005 TI - Thermal stability of SiOxCyHz films prepared by PECVD JF - Chemické listy VL - 99 IS - s49-s625 SP - 465-467 EP - 465-467 PB - Česká společnost chemická SN - 00092770 KW - thermal stability KW - TDS KW - PECVD KW - FTIR KW - RBSW KW - ERDA N2 - Thermal stability of SiOxCyHz films prepared using PECVD was studied by TDS, FTIR, RBS, ERDA and spectroscopic elipsometry. ER -
KUČEROVÁ, Zuzana, Vilma BURŠÍKOVÁ, Lenka ZAJÍČKOVÁ, Jana FRANCLOVÁ and Vratislav PEŘINA. Thermal stability of SiOxCyHz films prepared by PECVD. \textit{Chemické listy}. Praha: Česká společnost chemická, 2005, vol.~99, s49-s625, p.~465-467. ISSN~0009-2770.
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