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@book{596823, author = {Franclová, Jana and Kučerová, Zuzana and Buršíková, Vilma}, address = {Praha}, edition = {1.}, keywords = {PECVD; Thin Films; Electrical Properties}, language = {eng}, location = {Praha}, isbn = {80-86732-59-2}, publisher = {MATFYZPRESS}, title = {Electrical Properties of Plasma Deposited Thin Films}, year = {2005} }
TY - BOOK ID - 596823 AU - Franclová, Jana - Kučerová, Zuzana - Buršíková, Vilma PY - 2005 TI - Electrical Properties of Plasma Deposited Thin Films VL - WDS 05, Proceedings of Contributed Papers, Part II PB - MATFYZPRESS CY - Praha SN - 8086732592 KW - PECVD KW - Thin Films KW - Electrical Properties N2 - It is well known that MIM structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction). Thin films prepared using PECVD exhibited Pool-Frenkel conductivity (Schottky conductivity) at lower voltages and Fowler-Nordheim tunneling at higher voltages. ER -
FRANCLOVÁ, Jana, Zuzana KUČEROVÁ a Vilma BURŠÍKOVÁ. \textit{Electrical Properties of Plasma Deposited Thin Films}. 1. vyd. Praha: MATFYZPRESS, 2005, 4 s. WDS 05, Proceedings of Contributed Papers, Part II. ISBN~80-86732-59-2.
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