VAŠINA, Petr, Marcel MEŠKO, Mihai GANCIU, Jean BRETAGNE, Caroline BOISSE-LAPORTE, Ludovic DE POUCQUES and Michel TOUZEAU. Reduction of transient regime in fast preionized high power pulsed magnetron discharge. Europhysics Letters. Paríž: European Physical Society, 2005, vol. 72, No 3, p. 390-395, 5 pp. ISSN 0295-5075.
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Basic information
Original name Reduction of transient regime in fast preionized high power pulsed magnetron discharge
Name in Czech Omezení pechodového režimu pi pulzním magnetronovém naprašování
Authors VAŠINA, Petr (203 Czech Republic, guarantor), Marcel MEŠKO (703 Slovakia), Mihai GANCIU (642 Romania), Jean BRETAGNE (250 France), Caroline BOISSE-LAPORTE (250 France), Ludovic DE POUCQUES (250 France) and Michel TOUZEAU (250 France).
Edition Europhysics Letters, Paríž, European Physical Society, 2005, 0295-5075.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher France
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 2.237
RIV identification code RIV/00216224:14310/05:00012968
Organization unit Faculty of Science
UT WoS 000233556300010
Keywords in English pulsed magnetron; sputtering; preionization
Tags preionization, pulsed magnetron, sputtering
Changed by Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 23/2/2006 16:01.
Abstract
A high-power pulsed-magnetron discharge (several kW/cm2)is described. It operates at pulse duration of the order of few ľs, signicantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He bufer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few ľs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to 10A/cm2 induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion ux to the substrate. Preliminary result on Cu deposit in trenches is reported.
Abstract (in Czech)
Prezentace stabilního pulzního magnetronového výboje. Pro stabilizicaci depoziního procesu byla použita preionizace.
Links
GD202/03/H162, research and development projectName: Pokročilé směry ve fyzice a chemii plazmatu
Investor: Czech Science Foundation
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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