JAN, Mistrík, Ivan OHLÍDAL, Roman ANTOŠ, Mitsuru AOYAMA and Tomuo YAMAGUCHI. Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films. Applied Surface Science. USA: ELSEVIER (NORTH-HOLLAND), 2005, vol. 244, 1-4, p. 51-54. ISSN 0169-4332.
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Basic information
Original name Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films
Name in Czech Důkaz změny indexu lomu ve skleněných podložkách indukovanou deposicí SiO2 vrstev reaktivním plátováním s vysokou hustotou
Authors JAN, Mistrík (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Roman ANTOŠ (203 Czech Republic), Mitsuru AOYAMA (392 Japan) and Tomuo YAMAGUCHI (392 Japan).
Edition Applied Surface Science, USA, ELSEVIER (NORTH-HOLLAND), 2005, 0169-4332.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 1.263
RIV identification code RIV/00216224:14310/05:00015081
Organization unit Faculty of Science
UT WoS 000228600200013
Keywords in English ellipsometry; reflectometry; ion plating; SiO2/glass interface; change of refractive index; plasma-assisted deposition; Schott B270
Tags change of refractive index, ellipsometry, ion plating, plasma-assisted deposition, Reflectometry, Schott B270, SiO2/glass interface
Changed by Changed by: prof. RNDr. Ivan Ohlídal, DrSc., učo 2397. Changed: 28/2/2006 19:41.
Abstract
High-density reactive ion plating was used for SiO2 coating of Schott B270 glass. Optical properties of the sample were intensively studied by spectroscopic ellipsometry, reflectance and transmittance. Several optical models accounting for different structural defects, i.e., (1) gradient profile of refractive index in SiO2 layer, (2) transition layer between SiO2 and glass, and (3) induced slow variation of glass refractive index close to SiO2/glass interface were considered. The last one with increased value of substrate refractive index gave the best correspondence with the experimental data. (c) 2004 Elsevier B.V. All rights reserved.
Abstract (in Czech)
Reaktivní plátování s vysokou hustotou bylo použito pro pokrývání skla Schott B270 vrstvami SiO2. Optické vlastnosti vzorku byly rozsáhle studovány spektroskopickou elipsometrií, odrazivostí a propustností. Několik optických modelů bylo použito pro započtení strukturních defektů, tj. (1) gradientní profil indexu lomu v SiO2 vrstvě, (2) přechodová mezivrstva mezi SiO2 a sklem a (3) slabé změny v indexu lomu skla blízko rozhraní SiO2/sklo byly uvažovány. Poslední z nich obsahující zvýšení indexu lomu podložky vykazoval nejlepší korespondenci s experimentálními daty.
Links
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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