| BOCHNÍČEK, Zdeněk, Jan ČECHAL and Tomáš ŠIKOLA. X-ray reflection study of early stages of Pt silicide formation. In 7th Bienal Conference on High Resolution X-ray Diffraction and Imaging, Book of abstracts. Praha: Fyzikální ústav AV ČR, 2004, p. P7, 1 pp. |
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@inproceedings{634264,
author = {Bochníček, Zdeněk and Čechal, Jan and Šikola, Tomáš},
address = {Praha},
booktitle = {7th Bienal Conference on High Resolution X-ray Diffraction and Imaging, Book of abstracts},
keywords = {silicidation; Pt; XRR},
language = {eng},
location = {Praha},
pages = {P7},
publisher = {Fyzikální ústav AV ČR},
title = {X-ray reflection study of early stages of Pt silicide formation},
year = {2004}
}
TY - JOUR
ID - 634264
AU - Bochníček, Zdeněk - Čechal, Jan - Šikola, Tomáš
PY - 2004
TI - X-ray reflection study of early stages of Pt silicide formation
PB - Fyzikální ústav AV ČR
CY - Praha
KW - silicidation
KW - Pt
KW - XRR
N2 - X-ray reflection measured in-situ during annealing was used for studying of very early stages of silicide formation from Pt layer deposited on Si substrate. It was shown that interdiffusion betwen two components at temperatures slightly above 100degC which is much lower value than is reported for silicide creation observed by other experimental methods.
ER -
BOCHNÍČEK, Zdeněk, Jan ČECHAL and Tomáš ŠIKOLA. X-ray reflection study of early stages of Pt silicide formation. In \textit{7th Bienal Conference on High Resolution X-ray Diffraction and Imaging, Book of abstracts}. Praha: Fyzikální ústav AV ČR, 2004, p.~P7, 1 pp.
|
