BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Miroslav VALTR, Jiří BURŠÍK, Olga BLÁHOVÁ, Vratislav PEŘINA and Jan JANČA. Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings. Journal of advanced oxidation technologies. Dundas, Ontario, Canada: Science & Technology Network, Inc., 2006, vol. 9, No 2, p. 232-237, 5 pp. ISSN 1203-8407.
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Basic information
Original name Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings
Name in Czech Vliv příměsí křemíku, kyslíku a dusíku na vlastnosti amorfních diamantu podobných uhlíkových vrstev deponovaných v plazmatu
Authors BURŠÍKOVÁ, Vilma (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Pavel DVOŘÁK (203 Czech Republic), Miroslav VALTR (203 Czech Republic), Jiří BURŠÍK (203 Czech Republic), Olga BLÁHOVÁ (203 Czech Republic), Vratislav PEŘINA (203 Czech Republic) and Jan JANČA (203 Czech Republic).
Edition Journal of advanced oxidation technologies, Dundas, Ontario, Canada, Science & Technology Network, Inc. 2006, 1203-8407.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher Canada
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 0.850
RIV identification code RIV/00216224:14310/06:00017368
Organization unit Faculty of Science
UT WoS 000239478600023
Keywords in English Silicon; Oxygen; Nitrogen; Admixtures; PECVD; Amorphous Diamond-like Carbon Coatings
Tags Admixtures, Amorphous Diamond-like Carbon Coatings, Nitrogen, Oxygen, PECVD, Silicon
Tags International impact, Reviewed
Changed by Changed by: Mgr. Miroslav Valtr, Ph.D., učo 13715. Changed: 4/7/2009 17:59.
Abstract
Amorphous diamond-like carbon films (DLC) with various silicon, oxygen and nitrogen content were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. The films were prepared from the mixture of methane and hexamethyldisiloxane (HMDSO) in r.f. capacitively coupled discharges (13.56 MHz). The reactive plasma was investigated by optical emission spectroscopy and capacitive coupled planar probe. A combination of RBS, ERDA, FTIR and XPS methods was used to study the films' chemical composition and structure. The mechanical properties were studied using a depth sensing indentation technique. The films were mainly composed of C-C, C-H and C-Si bonds. The optimum deposition conditions for the preparation of DLC films, with enhanced thermo-mechanical stability, were determined.
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MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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