Influence of Silicon, Oxygen and Nitrogen Upon the Properties
of Plasma Deposited Amorphous Diamond-like Carbon Coatings

J 2006

Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings

BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Miroslav VALTR, Jiří BURŠÍK et. al.

Basic information

Original name

Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings

Name in Czech

Vliv příměsí křemíku, kyslíku a dusíku na vlastnosti amorfních diamantu podobných uhlíkových vrstev deponovaných v plazmatu

Authors

BURŠÍKOVÁ, Vilma (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Pavel DVOŘÁK (203 Czech Republic), Miroslav VALTR (203 Czech Republic), Jiří BURŠÍK (203 Czech Republic), Olga BLÁHOVÁ (203 Czech Republic), Vratislav PEŘINA (203 Czech Republic) and Jan JANČA (203 Czech Republic)

Edition

Journal of advanced oxidation technologies, Dundas, Ontario, Canada, Science & Technology Network, Inc. 2006, 1203-8407

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Canada

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 0.850

RIV identification code

RIV/00216224:14310/06:00017368

Organization unit

Faculty of Science

UT WoS

000239478600023

Keywords in English

Silicon; Oxygen; Nitrogen; Admixtures; PECVD; Amorphous Diamond-like Carbon Coatings

Abstract

V originále

Amorphous diamond-like carbon films (DLC) with various silicon, oxygen and nitrogen content were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. The films were prepared from the mixture of methane and hexamethyldisiloxane (HMDSO) in r.f. capacitively coupled discharges (13.56 MHz). The reactive plasma was investigated by optical emission spectroscopy and capacitive coupled planar probe. A combination of RBS, ERDA, FTIR and XPS methods was used to study the films' chemical composition and structure. The mechanical properties were studied using a depth sensing indentation technique. The films were mainly composed of C-C, C-H and C-Si bonds. The optimum deposition conditions for the preparation of DLC films, with enhanced thermo-mechanical stability, were determined.

Links

MSM0021622411, plan (intention)

Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface

Citovat

BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Miroslav VALTR, Jiří BURŠÍK, Olga BLÁHOVÁ, Vratislav PEŘINA and Jan JANČA. Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings. Journal of advanced oxidation technologies. Dundas, Ontario, Canada: Science & Technology Network, Inc., 2006, vol. 9, No 2, p. 232-237, 5 pp. ISSN 1203-8407.

@article{699203,
   author = {Buršíková, Vilma and Zajíčková, Lenka and Dvořák, Pavel and Valtr, Miroslav and Buršík, Jiří and Bláhová, Olga and Peřina, Vratislav and Janča, Jan},
   article_location = {Dundas, Ontario, Canada},
   article_number = {2},
   keywords = {Silicon; Oxygen; Nitrogen; Admixtures; PECVD; Amorphous Diamond-like Carbon Coatings},
   language = {eng},
   issn = {1203-8407},
   journal = {Journal of advanced oxidation technologies},
   title = {Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings},
   volume = {9},
   year = {2006}
}

TY  - JOUR
ID  - 699203
AU  - Buršíková, Vilma - Zajíčková, Lenka - Dvořák, Pavel - Valtr, Miroslav - Buršík, Jiří - Bláhová, Olga - Peřina, Vratislav - Janča, Jan
PY  - 2006
TI  - Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings
JF  - Journal of advanced oxidation technologies
VL  - 9
IS  - 2
SP  - 232-237
EP  - 232-237
PB  - Science & Technology Network, Inc.
SN  - 12038407
KW  - Silicon
KW  - Oxygen
KW  - Nitrogen
KW  - Admixtures
KW  - PECVD
KW  - Amorphous Diamond-like Carbon Coatings
N2  - Amorphous diamond-like carbon films (DLC) with various silicon, oxygen and nitrogen content were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. The films were prepared from the mixture of methane and hexamethyldisiloxane (HMDSO) in r.f. capacitively coupled discharges (13.56 MHz). The reactive plasma was investigated by optical emission spectroscopy and capacitive coupled planar probe. A combination of RBS, ERDA, FTIR and XPS methods was used to study the films' chemical composition and structure. The mechanical properties were studied using a depth sensing indentation technique. The films were mainly composed of C-C, C-H and C-Si bonds. The optimum deposition conditions for the preparation of DLC films, with enhanced thermo-mechanical stability, were determined.
ER  -

BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Miroslav VALTR, Jiří BURŠÍK, Olga BLÁHOVÁ, Vratislav PEŘINA and Jan JANČA. Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings. \textit{Journal of advanced oxidation technologies}. Dundas, Ontario, Canada: Science \&{} Technology Network, Inc., 2006, vol.~9, No~2, p.~232-237, 5 pp. ISSN~1203-8407.

Detailed Information on Publication Record