Comparison of structure and mechanical properties of SiO2-like
films deposited in O2/HMDSO pulsed and continuous plasmas

J 2006

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

BOSQUET, Angelique, Vilma BURŠÍKOVÁ, A. GOULLET, A. DJOUADI, Lenka ZAJÍČKOVÁ et. al.

Basic information

Original name

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

Name in Czech

Srovnání struktury SiO2-podobných vrstev deponovaných v pulzním a kontinuálním O2/HMDSO plazmatu

Authors

BOSQUET, Angelique (250 France), Vilma BURŠÍKOVÁ (203 Czech Republic, guarantor), A. GOULLET (250 France), A. DJOUADI (250 France), Lenka ZAJÍČKOVÁ (203 Czech Republic) and Agnes GRANIER (250 France)

Edition

Surface & coatings technology, Elsevier Science, 2006, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Netherlands

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 1.559

RIV identification code

RIV/00216224:14310/06:00017371

Organization unit

Faculty of Science

UT WoS

000237842300069

Keywords in English

SILICON DIOXIDE; COATINGS

Abstract

ORIG CZ

V originále

In many applications (ophthalmic lenses, car headlights, etc.), silicon oxide films are used as protective coatings in order to improve the mechanical properties of polymers. The Plasma Enhanced Chemical Vapor Deposition (PECVD), which allows deposition of dense films at temperature near the ambient, is particularly relevant for this. In this work, SiO2-like films have been deposited in a helicon reactor operated in inductive mode at low pressure with pulsed O-2/HMDSO plasmas. The influence of the plasma-off time on the structure and mechanical properties of deposited films are studied and compared to those of the film deposited with a continuously applied power. Ellipsometric measurements and infrared spectra show that all the films are SiO2-like films, transparent from 1.5 to 5 eV and possess a refractive index (n = 1.46 at 1.95 eV) close to the thermal oxide one. Good mechanical properties are observed from the depth sensing indentations by Fischerscope tester. The plastic hardness is found to decrease from 15.5 to 13.5 GPa when the plasma-off time increases, whereas the elastic modulus is the same (78 GPa). In continuous mode, the hardness value obtained is higher than the fused silica one (10 GPa) which is explained by a high compressive stress of 185 MPa, as determined from Newton's ring method. Plasma pulsing allows to reduce the compressive stress to 40 MPa. On the AFM micrographs, one can observe a buckling around the indentation print due to this compressive stress in films. The interfacial fracture toughness has been estimated from the radius of the delaminated area and linked to previous stress measurements. Moreover, all the films present a good resistance to delamination. (c) 2005 Elsevier B.V. All rights reserved.

In Czech

Srovnání struktury SiO2-podobných vrstev deponovaných v pulzním a kontinuálním O2/HMDSO plazmatu

Links

MSM0021622411, plan (intention)

Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface

Citovat

BOSQUET, Angelique, Vilma BURŠÍKOVÁ, A. GOULLET, A. DJOUADI, Lenka ZAJÍČKOVÁ and Agnes GRANIER. Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas. Surface & coatings technology. Elsevier Science, 2006, vol. 200, 22-23, p. 6517-6521, 4 pp. ISSN 0257-8972.

@article{699213,
   author = {Bosquet, Angelique and Buršíková, Vilma and Goullet, A. and Djouadi, A. and Zajíčková, Lenka and Granier, Agnes},
   article_number = {22-23},
   keywords = {SILICON DIOXIDE; COATINGS},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface & coatings technology},
   title = {Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas},
   volume = {200},
   year = {2006}
}

TY  - JOUR
ID  - 699213
AU  - Bosquet, Angelique - Buršíková, Vilma - Goullet, A. - Djouadi, A. - Zajíčková, Lenka - Granier, Agnes
PY  - 2006
TI  - Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas
JF  - Surface & coatings technology
VL  - 200
IS  - 22-23
SP  - 6517-6521
EP  - 6517-6521
PB  - Elsevier Science
SN  - 02578972
KW  - SILICON DIOXIDE
KW  - COATINGS
N2  - In many applications (ophthalmic lenses, car headlights, etc.), silicon oxide films are used as protective coatings in order to improve the mechanical properties of polymers. The Plasma Enhanced Chemical Vapor Deposition (PECVD), which allows deposition of dense films at temperature near the ambient, is particularly relevant for this. In this work, SiO2-like films have been deposited in a helicon reactor operated in inductive mode at low pressure with pulsed O-2/HMDSO plasmas. The influence of the plasma-off time on the structure and mechanical properties of deposited films are studied and compared to those of the film deposited with a continuously applied power. Ellipsometric measurements and infrared spectra show that all the films are SiO2-like films, transparent from 1.5 to 5 eV and possess a refractive index (n = 1.46 at 1.95 eV) close to the thermal oxide one. Good mechanical properties are observed from the depth sensing indentations by Fischerscope tester. The plastic hardness is found to decrease from 15.5 to 13.5 GPa when the plasma-off time increases, whereas the elastic modulus is the same (78 GPa). In continuous mode, the hardness value obtained is higher than the fused silica one (10 GPa) which is explained by a high compressive stress of 185 MPa, as determined from Newton's ring method. Plasma pulsing allows to reduce the compressive stress to 40 MPa. On the AFM micrographs, one can observe a buckling around the indentation print due to this compressive stress in films. The interfacial fracture toughness has been estimated from the radius of the delaminated area and linked to previous stress measurements. Moreover, all the films present a good resistance to delamination. (c) 2005 Elsevier B.V. All rights reserved.
ER  -

BOSQUET, Angelique, Vilma BURŠÍKOVÁ, A. GOULLET, A. DJOUADI, Lenka ZAJÍČKOVÁ and Agnes GRANIER. Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas. \textit{Surface \&{} coatings technology}. Elsevier Science, 2006, vol.~200, 22-23, p.~6517-6521, 4 pp. ISSN~0257-8972.

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