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@inproceedings{707510,
author = {Trunec, David and Šíra, Martin and Sťahel, Pavel and Buršíková, Vilma and Franta, Daniel},
address = {Saga, Japan},
booktitle = {10th International Symposium on High Pressure Low Temperature Plasma Chemistry},
keywords = {thin films; glow discharge; atmospheric pressure},
language = {eng},
location = {Saga, Japan},
pages = {331-334},
publisher = {Saga University},
title = {Deposition of thin films at higher substrate temperatures in atmospheric pressure glow discharge},
year = {2006}
}
TY - JOUR
ID - 707510
AU - Trunec, David - Šíra, Martin - Sťahel, Pavel - Buršíková, Vilma - Franta, Daniel
PY - 2006
TI - Deposition of thin films at higher substrate temperatures in atmospheric pressure glow discharge
PB - Saga University
CY - Saga, Japan
KW - thin films
KW - glow discharge
KW - atmospheric pressure
N2 - The atmospheric pressure glow discharge was used for the deposition of thin organosilicon polymer films. The plasma was burning in pure nitrogen used as a carrier gas and a small admixture of organosilicons compounds such as hexamethyldisilazane (HMDSN) or hexamethyldisiloxane (HMDSO) was used as a monomer. The temperature of the substrate was elevated up to 120 degrees of Celsia to obtain harder thin films. The homogeneity of thin films was enhanced using movable upper electrode. Electrical measurements were used to distinguish between glow and filamentary regime. Mechanical properties of deposited films were characterised by depth sensing indentation technique. The films were polymer-like, transparent in visible range, with uniform thickness and without pinholes.
ER -
TRUNEC, David, Martin ŠÍRA, Pavel SŤAHEL, Vilma BURŠÍKOVÁ a Daniel FRANTA. Deposition of thin films at higher substrate temperatures in atmospheric pressure glow discharge. In \textit{10th International Symposium on High Pressure Low Temperature Plasma Chemistry}. Saga, Japan: Saga University, 2006, s.~331-334.
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