ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ, Daniel FRANTA, Zuzana KUČEROVÁ, Angelique BOUSQUET, Antoine GOULLET and Agnes GRANIER. Deposition of protective couatings in RF organosilicon discharges. In In Abstracts of Invited Lectures and Contributed Papers, 18th Europhysics Conference on Atomic and Molecular Physics of Ionized Gases. Piacenza, Italy: European Physical Society, 2006, p. 51-54. ISBN 2-914771-38-X.
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Basic information
Original name Deposition of protective couatings in RF organosilicon discharges
Name in Czech Depozice ochranných povrchů ve vf. organosilikonových výbojích
Authors ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic), Daniel FRANTA (203 Czech Republic), Zuzana KUČEROVÁ (203 Czech Republic), Angelique BOUSQUET (250 France), Antoine GOULLET (250 France) and Agnes GRANIER (250 France).
Edition Piacenza, Italy, In Abstracts of Invited Lectures and Contributed Papers, 18th Europhysics Conference on Atomic and Molecular Physics of Ionized Gases, p. 51-54, 4 pp. 2006.
Publisher European Physical Society
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Italy
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/06:00018304
Organization unit Faculty of Science
ISBN 2-914771-38-X
Keywords in English deposition-organosilicon-discharge
Tags deposition-organosilicon-discharge
Tags International impact
Changed by Changed by: doc. RNDr. Vilma Buršíková, Ph.D., učo 2418. Changed: 31/3/2010 18:56.
Abstract
The aim of the present paer was to study the deposition of protective coatings in RF organosilicon discharges.
Abstract (in Czech)
cílem této publikace bylo studovat depozici ochranných vrstev ve vf. organosilikonových výbojích
Links
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
1K05025, research and development projectName: Příprava nových Si-O(N)-C materiálů plazmochemickou metodou
Investor: Ministry of Education, Youth and Sports of the CR, Synthesis of new Si-O(N)-C materials by plasmachemical methods
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