MEDUŇA, Mojmír, Jiří NOVÁK, Václav HOLÝ, Günther BAUER, Claudiu FALUB, Soichiro TSUJINO and Detlev GRÜTZMACHER. IN-SITU INVESTIGATIONS OF SI AND GE INTERDIFFUSION IN SIGE MULTILAYERS AND CASCADE STRUCTURES. In XTOP 2006 - 8th Biennial Conference on High Resolution X-Ray Diffraction and Imaging. Karlsruhe: Forchungszentrum Karlsruhe. p. 124. 2006.
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Basic information
Original name IN-SITU INVESTIGATIONS OF SI AND GE INTERDIFFUSION IN SIGE MULTILAYERS AND CASCADE STRUCTURES
Name in Czech In-situ studie Si a Ge interdifuse v SiGe multivrstvách a kaskádových strukturách
Authors MEDUŇA, Mojmír (203 Czech Republic, guarantor), Jiří NOVÁK (203 Czech Republic), Václav HOLÝ (203 Czech Republic), Günther BAUER (40 Austria), Claudiu FALUB (642 Romania), Soichiro TSUJINO (392 Japan) and Detlev GRÜTZMACHER (276 Germany).
Edition Karlsruhe, XTOP 2006 - 8th Biennial Conference on High Resolution X-Ray Diffraction and Imaging, p. 124-124, 2006.
Publisher Forchungszentrum Karlsruhe
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10302 Condensed matter physics
Country of publisher Germany
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/06:00016350
Organization unit Faculty of Science
Keywords in English interdiffusion; x-ray diffraction; thin films
Tags Interdiffusion, thin films, X-ray diffraction
Tags International impact
Changed by Changed by: Mgr. Mojmír Meduňa, Ph.D., učo 7898. Changed: 24/1/2007 13:09.
Abstract
We have performed in-situ x-ray reflectivity and diffraction measurements in the range around 700 C. The Ge content profile in SiGe multilayers was used for simulating the x-ray reflectivity or diffraction spectra.
Abstract (in Czech)
Provedli jsme in-situ měření rtg reflektivity a difrakce v oblasti teplot 700 C. Profil obsahu Ge v SiGe multivrstvách byl použit pro simulacespekter rtg reflexe a difrakce.
Links
GP202/05/P286, research and development projectName: Studium morfologie polovodičových multivrstev pomocí rtg rozptylu
Investor: Czech Science Foundation, Investigation of morphology of semiconductor multilayers using x-ray scattering
MSM0021622410, plan (intention)Name: Fyzikální a chemické vlastnosti pokročilých materiálů a struktur
Investor: Ministry of Education, Youth and Sports of the CR, Physical and chemical properties of advanced materials and structures
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