FRANTA, Daniel, Lenka ZAJÍČKOVÁ, Thomas BEGOU, Angelique BOUSQUET, Agnes GRANIER, Bruno BECHE and Antoine GOULLET. Modeling of optical constants of organosilicon thin films by parameterization of denstity of states. In 4th Workshop Ellipsometry. 2006th ed. Berlin: Uwe Beck, 2006, p. 110-111, 1 pp. ISBN 3-00-018751-0.
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Basic information
Original name Modeling of optical constants of organosilicon thin films by parameterization of denstity of states
Name in Czech Modelovani optickych konstant organosilikonovych vrstev pomoci paramtrizave hustoty stavu
Authors FRANTA, Daniel (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Thomas BEGOU (250 France), Angelique BOUSQUET (250 France), Agnes GRANIER (250 France), Bruno BECHE (250 France) and Antoine GOULLET (250 France).
Edition 2006. vyd. Berlin, 4th Workshop Ellipsometry, p. 110-111, 1 pp. 2006.
Publisher Uwe Beck
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Germany
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/06:00018470
Organization unit Faculty of Science
ISBN 3-00-018751-0
Keywords in English optical-konstant-organosilicon-density-states
Tags optical-konstant-organosilicon-density-states
Tags International impact
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 25/1/2007 22:04.
Abstract
Modeling of optical constants of organosilicon thin films by parameterization of denstity of states
Abstract (in Czech)
Modelovani optickych konstant organosilikonovych vrstev pomoci paramtrizave hustoty stavu
Links
MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
1K05025, research and development projectName: Příprava nových Si-O(N)-C materiálů plazmochemickou metodou
Investor: Ministry of Education, Youth and Sports of the CR, Synthesis of new Si-O(N)-C materials by plasmachemical methods
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