Detailed Information on Publication Record
2007
Deposition of protective coatings in rf organosilicon discharges
ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ, Zuzana KUČEROVÁ, Daniel FRANTA, Pavel DVOŘÁK et. al.Basic information
Original name
Deposition of protective coatings in rf organosilicon discharges
Name in Czech
Depozice ochranných vrstev ve vysokofrekvenčních výbojích v parách organosilikonu
Authors
ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic), Zuzana KUČEROVÁ (203 Czech Republic), Daniel FRANTA (203 Czech Republic), Pavel DVOŘÁK (203 Czech Republic), Radek ŠMÍD (203 Czech Republic), Vratislav PEŘINA (203 Czech Republic) and Anna MACKOVÁ (203 Czech Republic)
Edition
Plasma Sources Science and Technology, Bristol, Institute of Physics Publishing, 2007, 0963-0252
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
United Kingdom of Great Britain and Northern Ireland
Confidentiality degree
není předmětem státního či obchodního tajemství
Impact factor
Impact factor: 2.120
RIV identification code
RIV/00216224:14310/07:00022271
Organization unit
Faculty of Science
UT WoS
000244370700016
Keywords in English
CARBON-FILMS; GLOW-DISCHARGES; PLASMA; PECVD; POLYCARBONATE; SUBSTRATE
Tags
Tags
International impact, Reviewed
Změněno: 3/1/2011 11:26, doc. Mgr. Pavel Dvořák, Ph.D.
V originále
The paper discusses the deposition of protective coatings ranging from organosilicon plasma polymers to SiO2-like films and hard diamond-like carbon/silicon oxide (DLC : SiOx) coatings in radio frequency capacitively coupled discharges using hexamethyldisiloxane (HMDSO). As a result of the optimization of the deposition conditions it was possible to obtain high performance protective coatings. In the HMDSO/O-2 mixture, it was shown that rather than the SiO2-like film a hard cross-linked SiOx C-y H-z polymer film can be used as a protective coating for polycarbonate. The optimum conditions for the deposition of an almost stress-free film were 17% of HMDSO and dc bias voltage of -240V. The film hardness and elastic modulus were 10GPa and 75GPa, respectively. The refractive index at 600 nm was 1.5 and the extinction coefficient decreased from 0.02 at 240 nm down to zero at 600 nm. The films deposited from HMDSO/CH4 and HMDSO/CH4/H-2 mixtures exhibited the attractive properties of DLC films with the partial elimination of some of their drawbacks, such as absorption in the visible and a high intrinsic stress. The optimum concentration of the HMDSO was approximately 21%. Under these conditions the concentration of SiOx in the films was approximately 9 at.%. The film hardness and elastic modulus were above 22 GPa and 120 GPa, respectively.
In Czech
Článek diskutuje depozici různých typů ochranných vrstev, organosilikonových plazmových polymerů, SiO2 vrstev a tvrdých uhlíkových diamantu podobných vrstev s obsahem SiOx (DLC:SiOx), ve vysokofrekvenčním kapacitně vázaném výboji s použitím hexametyldisiloxanu (HMDSO). Vrstvy připravené z HMDSO/CH4 a HMDSO/CH4/H2 směsí vykazovaly atraktivní vlastnosti DLC vrstev s částečným optlačením jejich některých nevýhod jako jsou absorpce ve viditelné oblasti a vysoké vnitřní pnutí.
Links
| MSM0021622411, plan (intention) |
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| 1K05025, research and development project |
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