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@article{720369,
author = {Zajíčková, Lenka and Buršíková, Vilma and Kučerová, Zuzana and Franclová, Jana and Sťahel, Pavel and Peřina, Vratislav and Macková, Anna},
article_number = {1},
keywords = {Thin films;Organometallic compounds;Plasma deposition;Infrared spectroscopy;Mechanical properties},
language = {eng},
issn = {0022-3697},
journal = {Journal of Physics and Chemistry of Solids},
title = {Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties},
volume = {68},
year = {2007}
}
TY - JOUR
ID - 720369
AU - Zajíčková, Lenka - Buršíková, Vilma - Kučerová, Zuzana - Franclová, Jana - Sťahel, Pavel - Peřina, Vratislav - Macková, Anna
PY - 2007
TI - Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties
JF - Journal of Physics and Chemistry of Solids
VL - 68
IS - 1
SP - 1255-1259
EP - 1255-1259
PB - Elsevier
SN - 00223697
KW - Thin films;Organometallic compounds;Plasma deposition;Infrared spectroscopy;Mechanical properties
N2 - Thin organosilicon and silicon oxide films were deposited in r.f. capacitively coupled discharges from a mixture of hexamethyldisiloxane (HMDSO) and oxygen. The concentration of HMDSO was in the range 5-17%. Even for such relatively high dilution of HMDSO the organic-inorganic crossover of the film character was observed due to changes of the HMDSO concentration, but other factors, such as pressure and d.c. self-bias should also be taken into account. When annealed the films changed their composition, chemical structure and mechanical properties. We observed desorption of water, methane and CO or CO2 from the SiO2-like films. The hardness of the SiO2-like film, containing 5% carbon and 25% hydrogen, increased with the increase of annealing temperature from 5.9 (as deposited) to 11.3 GPa (500 oC). Simultaneously, its fracture toughness was significantly improved. These effects were explained by dehydration and cross-linking of the film. However, the mechanical properties of highly cross-linked SiO1:9C1:6H0:6 plasma polymer were superior over the SiO2-like film containing impurities and such film can be used as a protective coating with a hardness above 9.6 GPa up to the temperature of 400 oC.
ER -
ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ, Zuzana KUČEROVÁ, Jana FRANCLOVÁ, Pavel SŤAHEL, Vratislav PEŘINA and Anna MACKOVÁ. Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties. \textit{Journal of Physics and Chemistry of Solids}. Elsevier, vol.~68, No~1, p.~1255-1259. ISSN~0022-3697. 2007.
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