ŠÍRA, Martin, Vilma BURŠÍKOVÁ, Daniel FRANTA and David TRUNEC. Deposition and analysis of thin films produced in atmospheric pressure glow discharge. In Proceedings of XXVIII International Conference on Phenomena in Ionized Gases. Praha: J.Schmidt, M. Šimek, S.Pekárek, V.Prukner, 2007, p. 713-716. ISBN 978-80-87026-01-4.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Deposition and analysis of thin films produced in atmospheric pressure glow discharge
Name in Czech Depozice a analýza tenkých vrstev vytořených v atmosférickém doutnavém výboji
Authors ŠÍRA, Martin (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic), Daniel FRANTA (203 Czech Republic) and David TRUNEC (203 Czech Republic).
Edition Praha, Proceedings of XXVIII International Conference on Phenomena in Ionized Gases, p. 713-716, 4 pp. 2007.
Publisher J.Schmidt, M. Šimek, S.Pekárek, V.Prukner
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/07:00020440
Organization unit Faculty of Science
ISBN 978-80-87026-01-4
Keywords in English atmospheric pressure glow discharge thin films
Tags International impact
Changed by Changed by: Mgr. Martin Šíra, Ph.D., učo 13705. Changed: 6/9/2007 11:08.
Abstract
The atmospheric pressure glow discharge was used for the deposition of thin organosilicon polymer films. The plasma was burning in pure nitrogen used as a carrier gas and a small admixture of organosilicons compounds such as hexamethyldisilazane (HMDSN) or hexamethyldisiloxane (HMDSO) was used as a monomer. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. The homogeneity of thin films was enhanced using movable upper electrode. Electrical measurements were used to distinguish between glow and filamentary regime. Mechanical properties of deposited films were characterised by depth sensing indentation technique. The films were polymer-like, transparent in visible range, with uniform thickness and without pinholes.
Abstract (in Czech)
Tenké polymerní organosilikonové vrstvy byly deponovány v atmosférickém doutnavém výboji. Výboj byl zapálen v dusíku s malou příměsí hexamethyldisiloxanu. Teplota substrátu byla zvýšena až na 120 stupňů celsia za účelem zvýšení tvrdosti vrstev. Mezi doutnavým a filamentním výbojem bylo rozlišováno pomocí měření elektrických veličin. Mechanické vlastnosti vrstev byly určeny mikrotvrdoměrem. Vrstvy byly polymerního charakteru, průhledné v optickém spektru s uniformní tloušťkou a nízkou drsností.
Links
GA202/06/1473, research and development projectName: Depozice tenkých vrstev v dielektrických bariérových výbojích za atmosférického tlaku
Investor: Czech Science Foundation, Deposition of thin films in dielectric barrier discharges at atmospheric pressure
PrintDisplayed: 7/8/2024 01:33