Model of reactive magnetron sputtering process with non-uniform discharge current density
| VAŠINA, Petr, Tereza HYTKOVÁ and Marek ELIÁŠ. Model of reactive magnetron sputtering process with non-uniform discharge current density. In Proceeding of XXVIII International Conference on Phenomena in Ionized Gases. Praha: Institute of Plasma Physics AVCR, 2007, p. 1-4. ISBN 978-80-87026-01-4. |
|
Other formats:
BibTeX
LaTeX
RIS
|
| Basic information | |
|---|---|
| Original name | Model of reactive magnetron sputtering process with non-uniform discharge current density |
| Name in Czech | Model reaktivního magnetronového naprašování s nerovnoměrnou proudovou hustotou |
| Authors | VAŠINA, Petr (203 Czech Republic, guarantor), Tereza HYTKOVÁ (203 Czech Republic) and Marek ELIÁŠ (203 Czech Republic). |
| Edition | Praha, Proceeding of XXVIII International Conference on Phenomena in Ionized Gases, p. 1-4, 4 pp. 2007. |
| Publisher | Institute of Plasma Physics AVCR |
| Other information | |
|---|---|
| Original language | English |
| Type of outcome | Proceedings paper |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | Czech Republic |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14310/07:00020496 |
| Organization unit | Faculty of Science |
| ISBN | 978-80-87026-01-4 |
| Keywords in English | magnetron sputtering; reactive; Berg |
| Tags | Berg, magnetron sputtering, reactive |
| Changed by | Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 5/1/2010 11:15. |
| Abstract |
|---|
| Model of reactive magnetron sputtering process with non-uniform discharge current density, proceeding |
| Abstract (in Czech) |
|---|
| Model reaktivního magnetronového naprašování s nerovnoměrnou proudovou hustotou, sborník |
| Links | |
|---|---|
| GA202/05/0111, research and development project | Name: Studium kinetických procesů v dohasínajícím dusíkovém plazmatu s ohledem na jejich využití v chemické analýze |
| Investor: Czech Science Foundation, Study of kinetic processes in nitrogen post-discharge with respect to their use in chemical analysis | |
| MSM0021622411, plan (intention) | Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
| Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface | |
PrintDisplayed: 26/7/2024 15:25