Deposition of thin films on glass substrate in atmospheric
pressure glow discharge

D 2007

Deposition of thin films on glass substrate in atmospheric pressure glow discharge

ŠÍRA, Martin, Vilma BURŠÍKOVÁ and David TRUNEC

Basic information

Original name

Deposition of thin films on glass substrate in atmospheric pressure glow discharge

Name in Czech

Depozice tenkých vrstev v atmosférickém doutnavém výboji na skleněný substrát.

Authors

ŠÍRA, Martin (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic) and David TRUNEC (203 Czech Republic)

Edition

Bratislava, Slovensko, Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics, p. 144-147, 4 pp. 2007

Publisher

Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Slovakia

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/07:00020681

Organization unit

Faculty of Science

ISBN

978-80-89186-24-2

Keywords in English

atmospheric pressure glow discharge; thin films

Abstract

ORIG CZ

V originále

The atmospheric pressure glow discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas with a small admixture of organosilicon compound (hexamethyldisiloxane HMDSO) which was used as a monomer. Thin films was deposited on the glass substrate. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. Electrical measurements were used to distinguish between glow and filamentary regime. The surface atomic composition was measured by means of Xray Photoelectron Spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). Mechanical properties of deposited films were characterised by depth sensing indentation technique. The films were transparent in visible range. The comparison with thin films deposited on the silicon substrate is provided.

In Czech

Doutnavý výboj za atmosférického tlaku byl použit k depozici tenkých vrstev na skleněný substrát z monomeru hexamethyldisiloxanu (HMDSO).

Links

GA202/06/1473, research and development project

Name: Depozice tenkých vrstev v dielektrických bariérových výbojích za atmosférického tlaku

Investor: Czech Science Foundation, Deposition of thin films in dielectric barrier discharges at atmospheric pressure

Citovat

ŠÍRA, Martin, Vilma BURŠÍKOVÁ and David TRUNEC. Deposition of thin films on glass substrate in atmospheric pressure glow discharge. In Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics. Bratislava, Slovensko: Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia, 2007, p. 144-147. ISBN 978-80-89186-24-2.

@inproceedings{746187,
   author = {Šíra, Martin and Buršíková, Vilma and Trunec, David},
   address = {Bratislava, Slovensko},
   booktitle = {Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics},
   keywords = {atmospheric pressure glow discharge; thin films},
   language = {eng},
   location = {Bratislava, Slovensko},
   isbn = {978-80-89186-24-2},
   pages = {144-147},
   publisher = {Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia},
   title = {Deposition of thin films on glass substrate in atmospheric pressure glow discharge},
   year = {2007}
}

TY  - JOUR
ID  - 746187
AU  - Šíra, Martin - Buršíková, Vilma - Trunec, David
PY  - 2007
TI  - Deposition of thin films on glass substrate in atmospheric pressure glow discharge
PB  - Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia
CY  - Bratislava, Slovensko
SN  - 9788089186242
KW  - atmospheric pressure glow discharge
KW  - thin films
N2  - The atmospheric pressure glow discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas with a small admixture of organosilicon compound (hexamethyldisiloxane HMDSO) which was used as a monomer. Thin films was deposited on the glass substrate. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. Electrical measurements were used to distinguish between glow and filamentary regime. The surface atomic composition was measured by means of Xray Photoelectron Spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). Mechanical properties of deposited films were characterised by depth sensing indentation technique. The films were transparent in visible range. The comparison with thin films deposited on the silicon substrate is provided.
ER  -

ŠÍRA, Martin, Vilma BURŠÍKOVÁ and David TRUNEC. Deposition of thin films on glass substrate in atmospheric pressure glow discharge. In \textit{Book of Contributed Papers of The 3rd Seminar on New Trends in Plasma Physics and Solid State Physics}. Bratislava, Slovensko: Library and Publishing Centre in collaboration with Department of Experimental Physics, Comenius University, Bratislava, Slovakia; Union of Slovak Mathematicians and Physicists, Bratislava, Slovakia, 2007, p.~144-147. ISBN~978-80-89186-24-2.

Detailed Information on Publication Record