Detailed Information on Publication Record
2007
UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction
VALTR, Miroslav, Petr KLAPETEK, Ivan OHLÍDAL and Daniel FRANTABasic information
Original name
UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction
Name in Czech
Oxidace a-C:H tenké vrstvy pod UV světlem na vzduchu. Studie poklesu tloušťky
Authors
VALTR, Miroslav (203 Czech Republic, guarantor), Petr KLAPETEK (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic) and Daniel FRANTA (203 Czech Republic)
Edition
Optoelectronics and Advanced Materials - Rapid Communications, Bucharest, INOE & INFM, 2007, 1842-6573
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
RIV identification code
RIV/00216224:14310/07:00019537
Organization unit
Faculty of Science
UT WoS
000253725500014
Keywords in English
Amorphous carbon;Thin film;Optical properties;a-C:H;UV enhanced oxidation;Reflectance spectra
Tags
Tags
International impact, Reviewed
Změněno: 4/7/2009 18:59, Mgr. Miroslav Valtr, Ph.D.
V originále
UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction.
In Czech
Oxidace a-C:H tenké vrstvy pod UV světlem na vzduchu. Studie poklesu tloušťky.
Links
| KAN311610701, research and development project |
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| MSM0021622411, plan (intention) |
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