| VALTR, Miroslav, Petr KLAPETEK, Ivan OHLÍDAL and Daniel FRANTA. UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction. Optoelectronics and Advanced Materials - Rapid Communications. Bucharest: INOE & INFM, 2007, vol. 1, No 11, p. 620-624. ISSN 1842-6573. |
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@article{746839,
author = {Valtr, Miroslav and Klapetek, Petr and Ohlídal, Ivan and Franta, Daniel},
article_location = {Bucharest},
article_number = {11},
keywords = {Amorphous carbon;Thin film;Optical properties;a-C:H;UV enhanced oxidation;Reflectance spectra},
language = {eng},
issn = {1842-6573},
journal = {Optoelectronics and Advanced Materials - Rapid Communications},
title = {UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction},
url = {http://inoe.inoe.ro/oam-rc/},
volume = {1},
year = {2007}
}
TY - JOUR
ID - 746839
AU - Valtr, Miroslav - Klapetek, Petr - Ohlídal, Ivan - Franta, Daniel
PY - 2007
TI - UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction
JF - Optoelectronics and Advanced Materials - Rapid Communications
VL - 1
IS - 11
SP - 620-624
EP - 620-624
PB - INOE & INFM
SN - 18426573
KW - Amorphous carbon;Thin film;Optical properties;a-C:H;UV enhanced oxidation;Reflectance spectra
UR - http://inoe.inoe.ro/oam-rc/
N2 - UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction.
ER -
VALTR, Miroslav, Petr KLAPETEK, Ivan OHLÍDAL and Daniel FRANTA. UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction. \textit{Optoelectronics and Advanced Materials - Rapid Communications}. Bucharest: INOE \&{} INFM, 2007, vol.~1, No~11, p.~620-624. ISSN~1842-6573.
|
