J 2007

Deposition and Characterization of Nanostructured Silicon-Oxide Containing Diamond-Like Carbon Coatings

BURŠÍKOVÁ, Vilma, Pavel DVOŘÁK, Lenka ZAJÍČKOVÁ, Daniel FRANTA, Jan JANČA et. al.

Basic information

Original name

Deposition and Characterization of Nanostructured Silicon-Oxide Containing Diamond-Like Carbon Coatings

Name in Czech

Depozice a charakterizace nanostrukturovaných diamantu-podobných uhlíkových vrstev obsahujících oxid křemíku

Authors

BURŠÍKOVÁ, Vilma (203 Czech Republic, guarantor), Pavel DVOŘÁK (203 Czech Republic), Lenka ZAJÍČKOVÁ (203 Czech Republic), Daniel FRANTA (203 Czech Republic), Jan JANČA (203 Czech Republic), Jiří BURŠÍK (203 Czech Republic), Jaroslav SOBOTA (203 Czech Republic), Petr KLAPETEK (203 Czech Republic), Olga BLÁHOVÁ (203 Czech Republic) and Vratislav PEŘINA (203 Czech Republic)

Edition

Optoelectronics and Advanced Materials - Rapid Communications, Bucharest, INOE & INFM, 2007, 1842-6573

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Romania

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/07:00020754

Organization unit

Faculty of Science

UT WoS

000253725400002

Keywords in English

Nanostructured coatingsů;DLC;Hardness;Adhesion;Fracture toughness

Tags

International impact, Reviewed
Změněno: 3/1/2011 11:26, doc. Mgr. Pavel Dvořák, Ph.D.

Abstract

V originále

Nanostructured diamond-like carbon coatings with various silicon-oxide content were deposited on different substrate materials (silicon, glass, polycarbonate and steel) in capacitively coupled r.f. discharge (13.56 MHz). The structure of the prepared films was studied with infrared absorption spectroscopy (FTIR) and X-ray photoelectron spectroscopy. Complete atomic compositions, including hydrogen content and film densities, were determined by combination of RBS and ERD analyses. The complex dielectric function of the films was determined from ellipsometric measurements in the range 1.5-5.2 eV. Matrix Assisted Laser Desorption-Ionisation - Time of Flight Mass Spectrometry (MALDI-TOF) was used to study the deposited films. The mechanical properties of prepared coatings (e.g. hardness, elastic modulus, fracture toughness, coating/substrate adhesion etc.) were studied by means of depth sensing indentation technique using Fischerscope H100 tester. The tribological properties were studied using CSM pin-on-disc tester. The effect of intrinsic stress on the coating properties was investigated. The variation in SiOx content enabled to minimize the intrinsic compressive stress in coatings. Analysis of the evolved crack morphology by means of optical microscopy, scanning electron microscopy (SEM) and atomic force microscopy (AFM) revealed a significant increase in interfacial fracture toughness for the DLC:SiOx films compared to the pure DLC films. On the basis of above described investigation nanocomposite multilayer coatings with enhanced mechanical properties (high hardness, adhesion, fracture toughness, low intrinsic stress) were designed.

In Czech

Nanostrukturované diamantu-podobné uhlíkové vrstvy s různým obsahem oxidu křemíku.

Links

GA106/05/0274, research and development project
Name: Víceúrovňové studium vztahů mezi mechanickými a mikrostrukturními charakteristikami materiálů
Investor: Czech Science Foundation, Multiscale approach to relationships between mechanical and microstructural characteristics of materials
MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
1K05025, research and development project
Name: Příprava nových Si-O(N)-C materiálů plazmochemickou metodou
Investor: Ministry of Education, Youth and Sports of the CR, Synthesis of new Si-O(N)-C materials by plasmachemical methods