Plasma enhanced CVD of thin films using hexamethyldisiloxane
and octamethyltetrasiloxane monomers

D 2007

Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers

ZAJÍČKOVÁ, Lenka, Zuzana KUČEROVÁ, Daniel FRANTA, Vilma BURŠÍKOVÁ, Jiří BURŠÍK et. al.

Basic information

Original name

Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers

Name in Czech

Plazmochemická depozice vrstev z hexametyldisiloxanu a oktametyltetrasiloxanu

Authors

ZAJÍČKOVÁ, Lenka, Zuzana KUČEROVÁ, Daniel FRANTA, Vilma BURŠÍKOVÁ, Jiří BURŠÍK, Pavel SŤAHEL and Petr KLAPETEK

Edition

Kyoto, 18th International Symposium on Plasma Chemistry, p. 459-459, 2007

Publisher

International Plasma Chemistry Society

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Japan

Confidentiality degree

není předmětem státního či obchodního tajemství

Organization unit

Faculty of Science

Keywords in English

PECVD; HMDSO; OMCTS

Abstract

ORIG CZ

V originále

Siloxane polymers prepared by chemical methods are characterized by high flexibility, gas permeability and low surface energy. Due to their properties they find many applications in medicine and other fields. A little bit different group of materials are organosilicon films prepared by plasma enhanced chemical vapor deposition (PECVD) combining chemical and physical approaches. Monomers used in PECVD include usually hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) often mixed with O$_2$ for deposition of inorganic SiO$_2$-like films. Rarely, some other monomers like octamethyltetrasiloxane (D$_4$) are applied but, in PECVD, their structure is usually not retained because of their substantial dissociation. As a result, highly cross-linked polymers in which a repetition unit is not well defined are deposited. However, it can be modified by using pulsed plasmas in which the processes are driven by energetic electrons and ions during an on-time whereas free radicals and activated surface play an important role in an off-time phase. Changing the on-time and off-time a different retention of monomer structure can be achieved.

In Czech

Siloxanové polymery

Links

MSM0021622411, plan (intention)

Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface

1K05025, research and development project

Name: Příprava nových Si-O(N)-C materiálů plazmochemickou metodou

Investor: Ministry of Education, Youth and Sports of the CR, Synthesis of new Si-O(N)-C materials by plasmachemical methods

Citovat

ZAJÍČKOVÁ, Lenka, Zuzana KUČEROVÁ, Daniel FRANTA, Vilma BURŠÍKOVÁ, Jiří BURŠÍK, Pavel SŤAHEL and Petr KLAPETEK. Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers. In 18th International Symposium on Plasma Chemistry. Kyoto: International Plasma Chemistry Society, 2007, p. 459.

@inproceedings{747827,
   author = {Zajíčková, Lenka and Kučerová, Zuzana and Franta, Daniel and Buršíková, Vilma and Buršík, Jiří and Sťahel, Pavel and Klapetek, Petr},
   address = {Kyoto},
   booktitle = {18th International Symposium on Plasma Chemistry},
   keywords = {PECVD; HMDSO; OMCTS},
   language = {eng},
   location = {Kyoto},
   pages = {459-459},
   publisher = {International Plasma Chemistry Society},
   title = {Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers},
   year = {2007}
}

TY  - JOUR
ID  - 747827
AU  - Zajíčková, Lenka - Kučerová, Zuzana - Franta, Daniel - Buršíková, Vilma - Buršík, Jiří - Sťahel, Pavel - Klapetek, Petr
PY  - 2007
TI  - Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers
PB  - International Plasma Chemistry Society
CY  - Kyoto
KW  - PECVD
KW  - HMDSO
KW  - OMCTS
N2  - Siloxane polymers prepared by chemical methods are characterized by high flexibility, gas permeability and low surface energy. Due to their properties they find many applications in medicine and other fields. A little bit different group of materials are organosilicon films prepared by plasma enhanced chemical vapor deposition (PECVD) combining chemical and physical approaches. Monomers used in PECVD include usually hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) often mixed with O$_2$ for deposition of inorganic SiO$_2$-like films. Rarely, some other monomers like octamethyltetrasiloxane (D$_4$) are applied but, in PECVD, their structure is usually not retained because of their substantial dissociation. As a result, highly cross-linked polymers in which a repetition unit is not well defined are deposited. However, it can be modified by using pulsed plasmas in which the processes are driven by energetic electrons and ions during an on-time whereas free radicals and activated surface play an important role in an off-time phase. Changing the on-time and off-time a different retention of monomer structure can be achieved.
ER  -

ZAJÍČKOVÁ, Lenka, Zuzana KUČEROVÁ, Daniel FRANTA, Vilma BURŠÍKOVÁ, Jiří BURŠÍK, Pavel SŤAHEL and Petr KLAPETEK. Plasma enhanced CVD of thin films using hexamethyldisiloxane and octamethyltetrasiloxane monomers. In \textit{18th International Symposium on Plasma Chemistry}. Kyoto: International Plasma Chemistry Society, 2007, p.~459.

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