NISTLER, John, Koby DUCKWORTH, Jiří CHALOUPKA and Matt BROCK. Photonic band-gap masks to enhance resolution and depth of focus. Proceedings of SPIE. Bellingham: SPIE, 2007, vol. 6517, No 1, p. 65171F, 14 pp. ISSN 0277-786X. |
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@article{748845, author = {Nistler, John and Duckworth, Koby and Chaloupka, Jiří and Brock, Matt}, article_location = {Bellingham}, article_number = {1}, keywords = {lithographic mask; photonic band-gap}, language = {eng}, issn = {0277-786X}, journal = {Proceedings of SPIE}, title = {Photonic band-gap masks to enhance resolution and depth of focus}, volume = {6517}, year = {2007} }
TY - JOUR ID - 748845 AU - Nistler, John - Duckworth, Koby - Chaloupka, Jiří - Brock, Matt PY - 2007 TI - Photonic band-gap masks to enhance resolution and depth of focus JF - Proceedings of SPIE VL - 6517 IS - 1 SP - 65171F EP - 65171F PB - SPIE SN - 0277786X KW - lithographic mask KW - photonic band-gap N2 - The authors introduce initial simulation work on Photonic Bandgap Enhanced or PBE reticles that tends to address the manufacturing problems associated with typical PSM reticles while improving potential resolution capabilities to 35 and 25 nm utilizing 193 nm immersion lithography. The proposed approach for manufacturing reduces the overall defect issues associated with PSM approaches. ER -
NISTLER, John, Koby DUCKWORTH, Jiří CHALOUPKA and Matt BROCK. Photonic band-gap masks to enhance resolution and depth of focus. \textit{Proceedings of SPIE}. Bellingham: SPIE, 2007, vol.~6517, No~1, p.~65171F, 14 pp. ISSN~0277-786X.
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