NISTLER, John, Koby DUCKWORTH, Jiří CHALOUPKA and Matt BROCK. Photonic band-gap masks to enhance resolution and depth of focus. Proceedings of SPIE. Bellingham: SPIE, 2007, vol. 6517, No 1, p. 65171F, 14 pp. ISSN 0277-786X.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Photonic band-gap masks to enhance resolution and depth of focus
Name in Czech Zlepšení rozlišení a hloubky ostrosti u fotolitografických masek pomocí fotonického zakázaného pásu
Authors NISTLER, John, Koby DUCKWORTH, Jiří CHALOUPKA and Matt BROCK.
Edition Proceedings of SPIE, Bellingham, SPIE, 2007, 0277-786X.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10306 Optics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
Organization unit Faculty of Science
UT WoS 000246685900042
Keywords in English lithographic mask; photonic band-gap
Tags lithographic mask, photonic band-gap
Tags International impact
Changed by Changed by: doc. Mgr. Jiří Chaloupka, Ph.D., učo 53310. Changed: 9/4/2010 16:12.
Abstract
The authors introduce initial simulation work on Photonic Bandgap Enhanced or PBE reticles that tends to address the manufacturing problems associated with typical PSM reticles while improving potential resolution capabilities to 35 and 25 nm utilizing 193 nm immersion lithography. The proposed approach for manufacturing reduces the overall defect issues associated with PSM approaches.
Abstract (in Czech)
Zlepšení rozlišení a hloubky ostrosti u fotolitografických masek pomocí fotonického zakázaného pásu
PrintDisplayed: 3/5/2024 20:08