Detailed Information on Publication Record
2007
Structure and properties of DLC/SiOx films deposited in CW and pulsed plasma
GRANIER, A., T. BEGOU, C. DUQUENNE, M.A. DJOUADI, X. FENG et. al.Basic information
Original name
Structure and properties of DLC/SiOx films deposited in CW and pulsed plasma
Name in Czech
Struktura a vlastnosti DLC/SiOx vrstev připravených v CW a pulzním plazmatu
Authors
GRANIER, A., T. BEGOU, C. DUQUENNE, M.A. DJOUADI, X. FENG, Vilma BURŠÍKOVÁ and Lenka ZAJÍČKOVÁ
Edition
Kyoto, Japan, 18th International Symposium on Plasma Chemistry, Abstracts and Full-Papers CD, p. 1-4, 4 pp. 2007
Publisher
Kyoto University
Other information
Language
English
Type of outcome
Stať ve sborníku
Field of Study
10302 Condensed matter physics
Country of publisher
Japan
Confidentiality degree
není předmětem státního či obchodního tajemství
Organization unit
Faculty of Science
ISBN
978-9903773-2-8
Keywords in English
DLC;PECVD;HMDSO;mechanical properties
Tags
Tags
International impact
Změněno: 16/7/2008 14:06, Mgr. Petr Bureš
V originále
Structure and properties of DLC/SiOx films deposited in CW and pulsed plasma
In Czech
Struktura a vlastnosti DLC/SiOx vrstev připravených v CW a pulzním plazmatu
Links
GA106/05/0274, research and development project |
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KAN311610701, research and development project |
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MSM0021622411, plan (intention) |
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