ESLAVA, Salvador, Guillaume EYMERY, Přemysl MARŠÍK, Francesca IACOPI, Christine KIRSCHHOCK, Karen MAEX, Johan MARTENS and Mikhail BAKLANOV. Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing. Journal of the electrochemical society. New York: The Electrochemical Society, 2008, vol. 155, No 5, p. G115-G120, 6 pp. ISSN 0013-4651. |
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@article{768425, author = {Eslava, Salvador and Eymery, Guillaume and Maršík, Přemysl and Iacopi, Francesca and Kirschhock, Christine and Maex, Karen and Martens, Johan and Baklanov, Mikhail}, article_location = {New York}, article_number = {5}, keywords = {low-k; ellipsometry; UV-cure}, language = {eng}, issn = {0013-4651}, journal = {Journal of the electrochemical society}, title = {Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing}, volume = {155}, year = {2008} }
TY - JOUR ID - 768425 AU - Eslava, Salvador - Eymery, Guillaume - Maršík, Přemysl - Iacopi, Francesca - Kirschhock, Christine - Maex, Karen - Martens, Johan - Baklanov, Mikhail PY - 2008 TI - Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing JF - Journal of the electrochemical society VL - 155 IS - 5 SP - G115-G120 EP - G115-G120 PB - The Electrochemical Society SN - 00134651 KW - low-k KW - ellipsometry KW - UV-cure N2 - Ultraviolet-assisted curing (UV curing) has been recently applied to enhance the mechanical properties of low-k films. Knowledge about which ultraviolet energies are most effective is still limited and the consequences of applying the UV-curing process to integrated stacks in on-chip interconnects unknown. To clarify these open questions we investigated the optical properties of a SiCOH low-k layer by purged ultraviolet spectroscopic ellipsometry in the energy region 2-9 eV. The complex refractive index of the low-k film shows an absorption edge with a superimposed absorption band at 6.4 eV that vanishes upon ultraviolet-assisted curing. Comparison with Fourier transform infrared transmission demonstrates that the absorption at 6.4 eV must be attributed to the organic porogens, which have also influences on the absorption edge. ER -
ESLAVA, Salvador, Guillaume EYMERY, Přemysl MARŠÍK, Francesca IACOPI, Christine KIRSCHHOCK, Karen MAEX, Johan MARTENS and Mikhail BAKLANOV. Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing. \textit{Journal of the electrochemical society}. New York: The Electrochemical Society, 2008, vol.~155, No~5, p.~G115-G120, 6 pp. ISSN~0013-4651.
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