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@inproceedings{773067, author = {Dvořák, Pavel and Vašina, Petr}, address = {Praha}, booktitle = {Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology}, keywords = {higher harmonics; plasma; discharge; reactive sputtering; magnetron}, language = {eng}, location = {Praha}, isbn = {978-80-01-04030-0}, pages = {91-92}, publisher = {CVUT v Praze}, title = {Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process}, year = {2008} }
TY - JOUR ID - 773067 AU - Dvořák, Pavel - Vašina, Petr PY - 2008 TI - Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process PB - CVUT v Praze CY - Praha SN - 9788001040300 KW - higher harmonics KW - plasma KW - discharge KW - reactive sputtering KW - magnetron N2 - A new method to control whether a radio-freguency (RF) reactive sputtering deposition processes runs in a pre-adjusted experimental conditions was proposed. The frequency spectrum of the cathode voltage and of the voltage on an uncompensated probe immersed in the plasma was measured and it was proved, that some of the harmonics are extremely sensitive markers of the transition between the metallic and the compound mode of the RF sputtering. ER -
DVOŘÁK, Pavel and Petr VAŠINA. Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process. In \textit{Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology}. Praha: CVUT v Praze, 2008, p.~91-92, 1 pp. ISBN~978-80-01-04030-0.
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