| VAŠINA, Petr, Tereza HYTKOVÁ and Marek ELIÁŠ. Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process. In Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008. Praha: České vysoké učení technické, 2008, p. 172-173. ISBN 978-80-01-04030-0. |
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@inproceedings{773984,
author = {Vašina, Petr and Hytková, Tereza and Eliáš, Marek},
address = {Praha},
booktitle = {Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008},
keywords = {hysteresis; reactive sputtering},
language = {eng},
location = {Praha},
isbn = {978-80-01-04030-0},
pages = {172-173},
publisher = {České vysoké učení technické},
title = {Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process},
year = {2008}
}
TY - JOUR
ID - 773984
AU - Vašina, Petr - Hytková, Tereza - Eliáš, Marek
PY - 2008
TI - Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process
PB - České vysoké učení technické
CY - Praha
SN - 9788001040300
KW - hysteresis
KW - reactive sputtering
N2 - Theoretical study of role of neutral gas temperature on hysteresis behaviour of reactive sputtering deposition process
ER -
VAŠINA, Petr, Tereza HYTKOVÁ and Marek ELIÁŠ. Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process. In \textit{Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008}. Praha: České vysoké učení technické, 2008, p.~172-173. ISBN~978-80-01-04030-0.
|
