VAŠINA, Petr, Tereza HYTKOVÁ and Marek ELIÁŠ. Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process. In Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008. Praha: České vysoké učení technické, 2008, p. 172-173. ISBN 978-80-01-04030-0. |
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@inproceedings{773984, author = {Vašina, Petr and Hytková, Tereza and Eliáš, Marek}, address = {Praha}, booktitle = {Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008}, keywords = {hysteresis; reactive sputtering}, language = {eng}, location = {Praha}, isbn = {978-80-01-04030-0}, pages = {172-173}, publisher = {České vysoké učení technické}, title = {Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process}, year = {2008} }
TY - JOUR ID - 773984 AU - Vašina, Petr - Hytková, Tereza - Eliáš, Marek PY - 2008 TI - Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process PB - České vysoké učení technické CY - Praha SN - 9788001040300 KW - hysteresis KW - reactive sputtering N2 - Theoretical study of role of neutral gas temperature on hysteresis behaviour of reactive sputtering deposition process ER -
VAŠINA, Petr, Tereza HYTKOVÁ and Marek ELIÁŠ. Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process. In \textit{Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008}. Praha: České vysoké učení technické, 2008, p.~172-173. ISBN~978-80-01-04030-0.
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